Dielectric and optical properties of perovskite 995
taking into account an interdiffusion of Ba and Sr at the boundary of each
layer during the deposition at high temperatures. Although the enhancement
of the permittivity was confirmed by the superlattices prepared with a different
deposition process, the permittivity of RF-sputtered superlattices was much
lower than that prepared with the MBE process. This is obviously due to the
imperfection of superlattice structures in the sputter-derived films. We could
not, in fact, observe clear satellite peaks in the XRD analysis of the sputter-
derived films. The enhancement of the permittivity is sensitive to the quality
of superlattices. However, the enhancement of the permittivity in the films
deposited with a simple sputtering process has an important meaning for the
practical applications of perovskite superlattices. Decoupling capacitors on
Si-chips are currently demanded for the noise reduction and the stable electric-
current supply to the LSI circuits. The BTO–STO thin films are regarded as
one of the candidates for this application because of their relatively high
permittivity with low loss, but the permittivity at low deposition temperatures
still need to be enhanced at the present. The formation of superlattice-like
structures using simple sputtering process may give a new solution to satisfy
the requirements to the capacitor films.
Mechanism of permittivity enhancement in BTO/STO superlattices
Although the Maxwell–Wagner effects due to the electric conduction have
been pointed out as a mechanism of dielectric enhancements in oxide
superlattices,
30
we do not think that the anomalous dielectric behavior shown
in Fig. 32.17 is due to these effects because the superlattices showed relatively
low loss tangents, a linear Q–V relation (leakage current gives round shape
in the curve) and dielectric enhancement at high frequencies. It should be also
be noted that the result of dielectric enhancement is consistent with the change
of refractive index (Fig. 32.11) as well as the lattice distortions (Fig. 32.8).
The relaxation of crystal lattices and the stress directions in a BTO film,
a Ba
0.5
Sr
0.5
TiO
3
film and a BTO/STO superlattice on a STO substrate are
depicted in Fig. 32.19. A large in-plane compressive stress is applied to the
BTO films from the substrate because of the lattice mismatch between BTO
and STO. The BTO lattices near the substrate are distorted to elongate its c-
parameter (lattice parameter along the film thickness) while keeping the a-
parameter (lattice parameter along the film plane) to achieve the lattice
matching with the STO substrate. These strained lattices are relaxed with
increasing film thickness by introducing dislocations. The similar stress should
be applied to the (Ba
0.5
Sr
0.5
)TiO
3
film but the stress is lower than the case of
BTO film because of the smaller lattice mismatch between (Ba
0.5
Sr
0.5
)TiO
3
and STO. Therefore, the strained lattices are remained thicker than the case
of the BTO films. In the case of superlattices, the similar compressive stress
is applied to the first BTO layer from the substrate to distort the crystal