3.2.2 Inlet Systems 301
of magnitude higher than that using special designs, but still in a large number
of cases some means of sample pressure reduction is necessary. One way to cate-
gorize the different inlet systems is according to the sample pressure range, as
follows.
If the sample pressure is less than 10"^ torr (~10~-^ Pa), such as the residual
gas analysis of UHV systems, or UHV thin-film deposition processes, the ana-
lyzer may be simply immersed into the vacuum chamber or connected to a large-
diameter flange, possibly with an isolating valve. Immersion into the chamber as-
sures that especially with an open-type ion source the atmosphere of the chamber,
instead of an isolated pocket in a tube where filament-related or wall effects may
be more pronounced, is monitored. The possibility to valve the analyzer off can
assure that the analyzer is maintained at vacuum in case of temporary operations
at higher pressures or the cleanliness of the analyzer can be preserved during
short use of noninert gases.
If the pressure is within the range of 10-^-10 torr (--lO-'^-lO-^ Pa) and its
minimax ratio is 1:10 such as the case of certain process-monitoring applica-
tions,
a single, appropriately dimensioned orifice can be used. This is basically a
fixed aperture with an optional isolation valve. The flow through a small orifice
typically used (such as 0.05 mm) will be molecular below 1 torr (—100 Pa) [94],
therefore the flow into the analyzer will be of the same type as the outflow toward
the vacuum pump. (The pumping speed for gases of differing molecular weights
is assumed to follow ideal molecular flow laws.) Fractionation [96,97] of the
sample will not alter the composition unless the sample gas quantity is too small
and lighter components are depleted from the reservoir before the orifice. (In the
molecular flow regime the throughput is inversely proportional to the square root
of the molecular weight.)
If the max. pressure is below 10 torr (~
10-^
Pa), but the min:max ratio is higher
than 1:10, then a parallel arrangement of several orifices of varying size with in-
dividual shutofif valves can cover a pressure range wide enough on the expense of
complexity of the inlet system. It is very common to find a large-diameter high-
vacuum shutoff valve parallel with an orifice to perform residual gas analysis,
leak detection, and process control using the same instrument. Another alterna-
tive is to use variable leak valves that will cover a pressure range several orders of
magnitude wide with a single valve. Even though this is a simpler solution, there
are cases where the benefits of the high stability of a built-in fixed-size orifice,
which provides reproducible pressure ratio, outweigh the benefit of freely adjust-
able pressure in the analyzer. (Some leak valves exhibit large hysteresis and
creep;
their leak rate depends on the direction of adjustment (upward or down-
ward) with a step when changing direction (hysteresis) or the leak rate slowly
changes with time at a given setting (creep).)
If the sample pressure exceeds 10 torr
(—lO-"^
Pa), the simplest solution is again
the application of an adjustable leak valve or a fixed orifice. However, at such
high sample pressures the flow in the leak valve or orifice will be certainly in the