Contributors
Javier Aizpurua
Donostia International Physics Center
and Joint Center of Materials Physics
CSICUPV/EHU,
Paseo Manuel de Lardizabal 4,
Donostia-San Sebastian 20018
Spain
Erik P.A.M. Bakkers
Philips Research Laboratories,
High-Tech Campus 4,
5656 AE Eindhoven,
The Netherlands
Magnus T. Borgstr
¨
om
Philips Research Laboratories,
High-Tech Campus 4,
5656 AE Eindhoven,
The Netherlands
Ying-Lan Chang
Agilent Laboratories, Agilent
Technologies, 5301 Stevens Creek
Blvd, Santa Clara, CA 95051, USA
and
Nanomix, Inc., 5980 Horton Street,
Suite 600, Emeryville, CA 94608, USA
Marc Lamy de la Chapelle
Laboratoire de Nanotechnologie et
Instrumentation Optique,
Institut Charles Delaunay,
CNRS FRE 2848, P
ˆ
ole Physique,
Mat
´
eriaux et Nanotechnologie,
Universit
´
e de Technologie de Troyes,
12 rue Marie Curie, BP-2060,
10010 Troyes Cedex, France
Y. H. Chen
Key Laboratory of Semiconductor
Materials Science, Institute of
Semiconductors, Chinese Academy of
Sciences, PO Box 912, Beijing 100083,
P.R. China
Thomas Cornelius
Department of Materials Research,
Gesellschaft f
¨
ur Schwerionenforschung
(GSI), Planckstr. 1, 64291 Darmstadt,
Germany
Silke L. Diedenhofen
FOM Institute for Atomic and
Molecular Physics, AMOLF,
c/o Philips Research Laboratories,
High-Tech Campus 4, 5656 AE
Eindhoven, The Netherlands
Fei Gao
Pacific Northwest National Laboratory,
PO Box 999, Richland, WA 99352,
USA
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