Vacuum Generation
Fundamentals of Vacuum Technology
D00.46
LEYBOLD VACUUM PRODUCTS AND REFERENCE BOOK 2001/2002
first instance by those gases that prevail in
the vessel at the beginning of the pumping
process and are poorly or not at all
adsorbed (e.g. neon or helium) at the
zeolite surface. In atmospheric air, a few
parts per million of these gases are
present. Therefore, pressures < 10
-2
mbar
can be obtained.
If pressures below 10
-3
mbar exclusively
are to be produced with adsorption pumps,
as far as possible no neon or helium
should be present in the gas mixture.
After a pumping process, the pump must
be warmed only to room temperature for
the adsorbed gases to be given off and the
zeolite is regenerated for reuse. If air (or
damp gas) containing a great deal of water
vapor has been pumped, it is recom-
mended to bake out the pump completely
dry for a few hours at 200 °C or above.
To pump out larger vessels, several
adsorption pumps are used in parallel or in
series. First, the pressure is reduced from
atmospheric pressure to a few millibars by
the first stage in order to “capture” many
noble gas molecules of helium and neon.
After the pumps of this stage have been
saturated, the valves to these pumps are
closed and a previously closed valve to a
further adsorption pump still containing
clean adsorbent is opened so that this
pump may pump down the vacuum
chamber to the next lower pressure level.
This procedure can be continued until the
ultimate pressure cannot be further
improved by adding further clean adsorp-
tion pumps.
2.1.8.2 Sublimation pumps
Sublimation pumps are sorption pumps in
which a getter material is evaporated and
deposited on a cold inner wall as a getter
film. On the surface of such a getter film
the gas molecules form stable com-
pounds, which have an immeasurably low
vapor pressure. The active getter film is
renewed by subsequent evaporations.
Generally titanium is used in sublimation
pumps as the getter. The titanium is
evaporated from a wire made of a special
alloy of a high titanium content which is
heated by an electric current. Although the
optimum sorption capacity (about one
nitrogen atom for each evaporated tita-
nium atom) can scarcely be obtained in
practice, titanium sublimation pumps have
an extraordinarily high pumping speed for
active gases, which, particularly on star-
ting processes or on the sudden evolution
of greater quantities of gas, can be rapidly
pumped away. As sublimation pumps
function as auxiliary pumps (boosters) to
sputter-ion pumps and turbomolecular
pumps, their installation is often indi-
spensable (like the “boosters” in vapor
ejector pumps; see Section 2.1.6.2).
2.1.8.3 Sputter-ion pumps
The pumping action of sputter-ion pumps
is based on sorption processes that are
initiated by ionized gas particles in a Pen-
ning discharge (cold cathode discharge).
By means of “paralleling many individual
Penning cells” the sputter ion pump
attains a sufficiently high pumping speed
for the individual gases.
Operation of sputter-ion pumps
The ions impinge upon the cathode of the
cold cathode discharge electrode system
and sputter the cathode material (titanium).
The titanium deposited at other locations
acts as a getter film and adsorbs reactive
gas particles (e.g., nitrogen, oxygen, hydro-
gen). The energy of the ionized gas par-
ticles is not only high enough to sputter the
cathode material but also to let the
impinging ions penetrate deeply into the
cathode material (ion implantation). This
sorption process “pumps” ions of all types,
including ions of gases which do not
chemically react with the sputtered titanium
film, i.e. mainly noble gases.
The following arrangement is used to
produce the ions: stainless-steel, cylindri-
cal anodes are closely arranged between,
with their axes perpendicular to, two
parallel cathodes (see Fig. 2.61). The
cathodes are at negative potential (a few
kilovolts) against the anode. The entire
electrode system is maintained in a strong,
homogeneous magnetic field of a flux
density of B = 0.1 T, (T = Tesla = 10
4
Gauss) produced by a permanent magnet
attached to the outside of the pump’s
casing. The gas discharge profduced by
the high tension contains electrons and
ions. Under the influence of the magnetic
field the electrons travel along long spiral
tracks (see Fig. 2.61) until they impinge on
the anode cylinder of the corresponding
cell. The long track increases ion yield,
which even at low gas densities (pres-
sures) is sufficient to maintain a self-
sustained gas discharge. A supply of elec-
trons from a hot cathode is not required.
Because of their great mass, the
movement of the ions is unaffected by the
magnetic field of the given order of mag-
nitude; they flow off along the shortest
path and bombard the cathode.
The discharge current i is proportional to
the number density of neutral particles n
0
,
the electron density n-, and the length l of
the total discharge path:
i = n
0
· n
–
· σ · l (2.25)
The effective cross section s for ionizing
collisions depends on the type of gas.
According to (2.25), the discharge current
i is a function of the number particle
density n0, as in a Penning gauge, and it
can be used as a measure of the pressure
in the range from 10
-4
to 10
-8
mbar. At
lower pressures the measurements are not
reproducible due to interferences from
field emission effects.
In diode-type, sputter-ion pumps, with an
electrode system configuration as shown
in Fig. 2.62, the getter films are formed on
the anode surfaces and between the
sputtering regions of the opposite
cathode. The ions are buried in the
cathode surfaces. As cathode sputtering
proceeds, the buried gas particles are set
free again. Therefore, the pumping action
for noble gases that can be pumped only
by ion burial will vanish after some time
Fig. 2.61 Operating principle of a sputter-ion pump
PZ
← ⊕ Direction of motion of the ionized gas
molecules
• → Direction of motion of the sputtered
titanium
- – – - Spiral tracks of the electrons
PZ Penning cells
D00 E 19.06.2001 21:37 Uhr Seite 46