Martin P.M. Handbook of Deposition Technologies for Films and Coatings, Third Edition: Science, Applications and Technology

Подождите немного. Документ загружается.

Unﬁltered and Filtered Cathodic Arc Deposition 521

[47] J. Kutzner, H.C. Miller, In ﬂux from the cathode region of a vacuum arc, IEEE Trans. Plasma Sci. 17 (1989)

688–694.

[48] V.A. Ivanov, B. J

uttner, H. Pursch, Time-resolved measurements of the parameters of arc cathode plasmas in

vacuum, IEEE Trans. Plasma Sci. 13 (1985) 334–336.

[49] C.W. Kimblin, Cathode spot erosion and ionization phenomena in the transition region from vacuum to

atmospheric pressure arcs, J. Appl. Phys. 45 (1974) 5235–5244.

[50] J.E. Daalder, Components of cathode erosion in vacuum arcs, J. Phys. D: Appl. Phys. 9 (1976)

2379–2395.

[51] A. Anders, G.Y. Yushkov, Ion ﬂux from vacuum arc cathode spots in the absence and presence of magnetic

ﬁelds, J. Appl. Phys. 91 (2002) 4824–4832.

[52] A. Anders, E.M. Oks, G.Y. Yushkov, K.P. Savkin, Y. Brown, A.G. Nikolaev, Determination of the speciﬁc

ion erosion of the vacuum arc cathode by measuring the total ion current from the discharge plasma, Tech.

Phys. 51 (2006) 1311–1315.

[53] V.M. Lunev, V.G. Padalka, V.M. Khoroshikh, Plasma properties of a metal vacuum arc. II, Sov. Phys. Tech.

Phys. 22 (1977) 858–861.

[54] W.D. Davis, H.C. Miller, Analysis of the electrode products emitted by dc arcs in a vacuum ambient,

J. Appl. Phys. 40 (1969) 2212–2221.

[55] A.A. Plyutto, V.N. Ryzhkov, A.T. Kapin, High speed plasma streams in vacuum arcs, Sov. Phys. JETP 20

(1965) 328–337.

[56] I.G. Brown, B. Feinberg, J.E. Galvin, Multiply stripped ion generation in the metal vapor vacuum arc,

J. Appl. Phys. 63 (1988) 4889–4898.

[57] I.G. Brown, X. Godechot, Vacuum arc ion charge-state distributions, IEEE Trans. Plasma Sci. 19 (1991)

713–717.

[58] A. Anders, S. Anders, B. J

uttner, I.G. Brown, Time dependence of vacuum arc parameters, IEEE Trans.

Plasma Sci. PS-21 (1993) 305–311.

[59] E. Oks, I.G. Brown, M.R. Dickinson, R.A. MacGill, P. Sp

adtke, H. Emig, B.H. Wolf, Elevated ion charge

states in vacuum arc plasmas in a magnetic ﬁeld, Appl. Phys. Lett. 67 (1995) 200–202.

[60] F.J. Paoloni, I.G. Brown, Some observations of the effect of magnetic ﬁeld and arc current on the vacuum

arc charge state distribution, Rev. Sci. Instrum. 66 (1995) 3855–3858.

[61] I.G. Brown, Vacuum arc ion sources, Rev. Sci. Instrum. 65 (1994) 3061–3081.

[62] A.N. Pustovit, V.I. Zhila, G.G. Sikharulidze, Mass spectral diagnostics of plasma formed at cathode tip

explosion, Sov. Phys. Tech. Phys. 31 (1986) 496–497.

[63] I.G. Brown (Ed.), The Physics and Technology of Ion Sources, Wiley-VCH, Weinheim (2004).

[64] A.I. Ryabchikov, I.B. Stepanov, S.V. Dektjarev, E.I. Lukonin, I.A. Shulepov, Very broad vacuum arc ion and

plasma sources with extended large area cathodes, Rev. Sci. Instrum. 71 (2000) 704–706.

[65] A. Anders, B. Yotsombat, R. Binder, Correlation between cathode properties, burning voltage, and plasma

parameters of vacuum arcs, J. Appl. Phys. 89 (2001) 7764–7771.

[66] C. Kittel, Introduction to Solid State Physics, John Wiley & Sons, New York (1986).

[67] A. Anders, Ion charge state distributions of vacuum arc plasmas: The origin of species, Phys. Rev. E 55

(1997) 969–981.

[68] A. Anders, G. Yushkov, E. Oks, A. Nikolaev, I. Brown, Ion charge state distributions of pulsed vacuum arc

plasmas in strong magnetic ﬁelds, Rev. Sci. Instrum. 69 (1998) 1332–1335.

[69] I.A. Krinberg, On the mechanism of the external magnetic ﬁeld action on the electron temperature and ion

charge state distribution in a vacuum arc plasma, Techn. Phys. Lett. 29 (2003) 504–506.

[70] E.M. Oks, A. Anders, I.G. Brown, M.R. Dickinson, R.A. MacGill, Ion charge state distributions in high

current vacuum arc plasma in a magnetic ﬁeld, IEEE Trans. Plasma Sci. 24 (1996) 1174–1183.

[71] I.A. Krinberg, The ion charge–current strength relationship in stationary and pulsed vacuum discharges,

Tech. Phys. Lett. 27 (2001) 45–48.

[72] C.W. Kimblin, A review of arcing phenomena in vacuum and in the transition to atmospheric pressure arcs,

IEEE Trans. Plasma Sci. 10 (1971) 322–330.

522 Chapter 10

[73] I.I. Demidenko, N.S. Lomino, V.D. Ovcharenko, V.G. Padalka, G.N. Polyakova, Ionization mechanism for

nitrogen in a vacuum arc discharge, Sov. Phys Tech. Phys. 29 (1984) 895–897.

[74] P.J. Martin, D.R. McKenzie, R.P. Netterﬁeld, P. Swift, S.W. Filipczuk, K.-H. M

uller et al., Characteristics of

titanium arc evaporation processes, Thin Solid Films 153 (1987) 91–102.

[75] M. Sakaki, T. Sakakibara, Excitation, ionization, and reaction mechanism of a reactive cathodic arc

deposition of TiN, IEEE Trans. Plasma Sci. 22 (1994) 1049–1054.

[76] E. Oks, G. Yushkov, Some features of vacuum arc plasmas with increasing gas pressure in the discharge gap,

in: XVIIth Int. Symp., Discharges and Electrical Insulation in Vacuum, Berkeley, CA (1996) 584–588.

[77] M.M.M. Bilek, P.J. Martin, D.R. McKenzie, Inﬂuence of gas pressure and cathode composition on ion

energy distributions in ﬁltered cathodic vacuum arcs, J. Appl. Phys. 83 (1998) 2965–2970.

[78] J.M. Schneider, A. Anders, I.G. Brown, B. Hj

orvarsson, L. Hultman, Temporal development of the plasma

composition of a pulsed aluminum plasma stream in the presence of oxygen, Appl. Phys. Lett. 75 (1999)

612–614.

[79] J. Ros

en, A. Anders, L. Hultman, J.M. Schneider, Temporal development of the composition of Zr and Cr

cathodic arc plasma streams in a N

environment, J. Appl. Phys. 94 (2003) 1414–1419.

[80] J. Ros

en, A. Anders, L. Hultman, J.M. Schneider, Charge state and time resolved plasma composition of a

pulsed zirconium arc in a nitrogen environment, J. Appl. Phys. 96 (2004) 4793–4799.

[81] J. Ros

en, A. Anders, S. Mr

az, A. Atiser, J.M. Schneider, Inﬂuence of argon and oxygen on

charge-state-resolved ion energy distributions of ﬁltered aluminum arc, J. Appl. Phys. 99 (2006) 123303-1–5.

[82] B.M. Smirnov, Atomic structure and the resonant charge exchange process, Uspekhi Fizicheskikh Nauk. 171

(2001) 233–266.

[83] R.K. Janev, J.W. Gallagher, Evaluated theoretical cross-section data for charge exchange of multiply charged

ions with atoms. III. Nonhydrogenic target atoms, J. Phys. Chem. Reference Data 13 (1984) 1199–1249.

[84] J. Kutzner, H.C. Miller, Integrated ion ﬂux emitted from the cathode spot region of a diffuse vacuum arc,

J. Phys. D: Appl. Phys. 25 (1992) 686–693.

[85] J. Ros

en, A. Anders, S. Mr

az, J.M. Schneider, Charge-state-resolved ion energy distributions of aluminum

vacuum arcs in the absence and presence of a magnetic ﬁeld, J. Appl. Phys. 97 (2005) 103306-1–6.

[86] M.A. Lieberman, A.J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, John Wiley

& Sons, New York (1994).

[87] J. Ros

en, J.M. Schneider, A. Anders, Charge state dependence of cathodic vacuum arc ion energy and

velocity distributions, Appl. Phys. Lett. 89 (2006) 141502-1–3.

[88] K. Tsuruta, K. Skiya, G. Watanabe, Velocities of copper and silver ions generated from an impulse vacuum

arc, IEEE Trans. Plasma Sci. 25 (1997) 603–608.

[89] A.S. Bugaev, V.I. Gushenets, A.G. Nikolaev, E.M. Oks, G.Y. Yushkov, Inﬂuence of a current jump on

vacuum arc parameters, IEEE Trans. Plasma Sci. 27 (1999) 882–887.

[90] A.S. Bugaev, E.M. Oks, G.Y. Yushkov, A. Anders, I.G. Brown, Enhanced ion charge states in vacuum arc

plasmas using a ‘current spike’ method, Rev. Sci. Instrum. 71 (2000) 701–703.

[91] G.Y. Yushkov, A. Anders, E.M. Oks, I.G. Brown, Ion velocities in vacuum arc plasmas, J. Appl. Phys. 88

(2000) 5618–5622.

[92] A. Anders, E. Oks, Charge-state-resolved ion energy distribution functions of cathodic vacuum arcs: A study

involving the plasma potential and biased plasmas, J. Appl. Phys. 101 (2007) 043304-1–6.

[93] E. Byon, A. Anders, Ion energy distribution functions of vacuum arc plasmas, J. Appl. Phys. 93 (2003)

1899–1906.

[94] G. Yushkov, Measurements of directed ion velocity in vacuum arc plasmas by arc current perturbation

methods, in: Proc. of XXth Int. Symp. on Discharges and Electrical Insulation in Vacuum, Xi’an, P.R. China

(2000) 260–263.

[95] E.A. Litvinov, Kinetic of cathode jet at explosive emission of electrons, in: G.A. Mesyats (Ed.), High

Current Nanosecond Pulsed Sources of Accelerated Electrons, Nauka, Novosibirsk (1974) (in Russian).

[96] I.A. Krinberg, M.P. Lukovnikova, Application of a vacuum arc model to the determination of cathodic

microjet parameters, J. Phys. D: Appl. Phys. 29 (1996) 2901–2906.

Unﬁltered and Filtered Cathodic Arc Deposition 523

[97] G.Y. Yushkov, A.S. Bugaev, I.A. Krinberg, E.M. Oks, On a mechanism of ion acceleration in vacuum

arc-discharge plasma, Doklady Phys. 46 (2001) 307–309.

[98] I.A. Krinberg, Acceleration of multicomponent plasma in the cathode region of vacuum arc, Techn. Phys. 46

(2001) 1371–1378.

[99] L.P. Sablev, J.I. Dolotov, L.I. Getman, V.N. Gorbunov, E.G. Goldiner, K.T. Kirshfeld, V.V. Usov, Apparatus

for vacuum evaporation of metals under the action of an electric arc, Patent US 3,783,231 (1974).

[100] A.A. Snaper, Arc deposition process and apparatus, Patent US 3,836,451 (1974).

[101] A.A. Snaper, Arc deposition process and apparatus, Patent US 3,625,848 (1971).

[102] P. Hovsepian, Lichtbogen-Verdampfungsvorrichtung, Patent DE 4220588 (1994).

[103] L.P. Sablev, N.P. Atamansky, V.N. Gorbunov, J.I. Dolotov, V.N. Lutseenko, V.M. Lunev, V.V. Usov,

Apparatus for metal evaporation coating, Patent US 3,793,179 (1974).

[104] I.I. Aksenov, A.A. Andreev, Motion of the cathode spot of a vacuum arc in an inhomogeneous magnetic

ﬁeld, Sov. Tech. Phys. Lett. 3 (1977) 525–526.

[105] D.A. Karpov, Cathodic arc sources and macroparticle ﬁltering, Surf. Coat. Technol. 96 (1997) 22–33.

[106] G.E. Vergason, Electric arc vapor deposition device, Patent US 5,037,522 (1991).

[107] K. Brondum, G. Larson, Low-temperature arc vapor deposition as a hexavalent chrome electroplating

alternative, Vapor Technologies Inc., Longmont, CO (May 13, 2005).

[108] R.P. Welty, Apparatus and method for coating a substrate using vacuum arc evaporation, Patent US

5,269,898 (1993).

[109] P. Siemroth, T. Sch

ulke, T. Witke, High-current arc–anewsource for high-rate deposition, Surf. Coat.

Technol. 68 (1994) 314–319.

[110] T. Witke, P. Siemroth, Deposition of droplet-free ﬁlms by vacuum arc evaporation – results and applications,

IEEE Trans. Plasma Sci. 27 (1999) 1039–1044.

[111] M. B

uschel, W. Grimm, Inﬂuence of the pulsing of the current of a vacuum arc on rate and droplets, Surf.

Coat. Technol. 142-144 (2001) 665–668.

[112] T.W.H. Oates, J. Pigott, D.R. McKenzie, M.M.M. Bilek, A high-current pulsed cathodic vacuum arc plasma

source, Rev. Sci. Instrum. 74 (2003) 4750–4754.

[113] J.E. Daalder, Cathode spots and vacuum arcs, Physica C 104C (1981) 91–106.

[114] Y.Y. Udris, Investigation in the ﬁeld of electric discharges in gases, Trudy VEI (All-Union Order of Lenin

Institute of Electric Engineering), Vol.63, Gosenergoizdat, Moscow (1958) (in Russian).

[115] T. Utsumi, J.H. English, Study of electrode products emitted by vacuum arcs in form of molten metal

particles, J. Appl. Phys. 46 (1975) 126–131.

[116] D.T. Tuma, C.L. Chen, D.K. Davis, Erosion products from the cathode spot region of a copper vacuum arc,

J. Appl. Phys. 49 (1978) 3821–3831.

[117] B. Gellert, E. Schade, E. Dullni, IEEE Trans. Plasma Sci. PS-15 (1987) 545–551.

[118] G. Disatnik, R.L. Boxman, S. Goldsmith, Characteristics of macroparticle emission from a

high-current-density multi-cathode spot vacuum arc, IEEE Trans. Plasma Sci. PS-15 (1987) 520–523.

[119] S. Shalev, S. Goldsmith, R.L. Boxman, S. Einav, J.M. Avidor, Laser Doppler anemometry: a tool for

studying macroparticle dynamics in a vacuum arc, J. Phys. E: Sci. Instrum. 17 (1984) 56–61.

[120] S. Shalev, R.L. Boxmann, S.J. Goldsmith, Velocities and emission rates of cathode-produced molybdenum

macroparticles in a vacuum arc, J. Appl. Phys. 58 (1985) 2503–2507.

[121] S. Shalev, R.L. Boxman, S. Goldsmith, IEEE Trans. Plasma Sci. PS-14 (1986) 59–62.

[122] B. Gellert, E. Schade, Optical investigation of droplet emission in vacuum interrupters to improve contact

materials, in: XIVth Int. Symp. on Discharges and Electrical Insulation in Vacuum, Santa Fe (1990) 450–454.

[123] R.L. Boxman, S. Goldsmith, Macroparticle contamination in cathodic arc coatings: Generation, transport

and control, Surf. Coat. Technol. 52 (1992) 39–50.

[124] M. Kandah, J.-L. Meunier, Study of microdroplet generation from vacuum arcs on graphite cathodes, J. Vac.

Sci. Technol. A 13 (1995) 2444–2450.

[125] M. Kandah, J.-L. Meunier, Erosion study on graphite cathodes using pulsed vacuum arcs, IEEE Trans.

Plasma Sci. 24 (1996) 523–527.

524 Chapter 10

[126] S. Anders, A. Anders, K.M. Yu, X.Y. Yao, I.G. Brown, On the macroparticle ﬂux from vacuum arc cathode

spots, IEEE Trans. Plasma Sci. 21 (1993) 440–446.

[127] T. Sch

ulke, A. Anders, Velocity distribution of carbon macroparticles generated by pulsed vacuum arcs,

Plasma Sources Sci. Technol. 8 (1999) 567–571.

[128] D. Drescher, J. Koskinen, H.-J. Scheibe, A. Mensch, A model for particle growth in arc deposited

amorphous carbon ﬁlms, Diamond Rel. Mater. 7 (1998) 1375–1380.

[129] V.S. Voitsenya, A.G. Gorbanyuk, I.N. Onishchenko, B.G. Safronov, N.A. Khizhniyak, V.V. Shkoda, Motion

of a plasmoid in a curvilinear magnetic ﬁeld, Sov. Phys. Tech. Phys. 12 (1967) 185–192.

[130] I.I. Aksenov, V.A. Belous, V.G. Padalka, V.M. Khoroshikh, Transport of plasma streams in a curvilinear

plasma-optics system, Sov. J. Plasma Phys. 4 (1978) 425–428.

[131] I.I. Aksenov, V.A. Belous, V.G. Padalka, V.M. Khoroshikh, Apparatus to rid the plasma of a vacuum arc of

macroparticles, Instrum. Exp. Tech. 21 (1978) 1416–1418.

[132] A. Anders, S. Anders, I.G. Brown, Effect of duct bias on transport of vacuum arc plasmas through curved

magnetic ﬁlters, J. Appl. Phys. 75 (1994) 4900–4905.

[133] M.M.M. Bilek, D.R. McKenzie, Y. Yin, M.U. Chhowalla, W.I. Milne, Interactions of the directed plasma

from a cathodic arc with electrodes and magnetic ﬁeld, IEEE Trans. Plasma Sci. 24 (1996) 1291–1298.

[134] S. Anders, A. Anders, M.R. Dickinson, R.A. MacGill, I.G. Brown, S-shaped magnetic macroparticle ﬁlter

for cathodic arc deposition, IEEE Trans. Plasma Sci. 25 (1997) 670–674.

[135] T. Witke, T. Schuelke, B. Schultrich, P. Siemroth, J. Vetter, Comparison of ﬁltered high current pulsed arc

deposition (f-HCA) with conventional vacuum arc methods, Surf. Coat. Technol. 126 (2000) 81–88.

[136] X. Shi, B.K. Tay, H.S. Tan, E. Liu, J. Shi, L.K. Cheah, X. Jin, Transport of vacuum arc plasma through an

off-plane double bend ﬁltering duct, Thin Solid Films 345 (1999) 1–6.

[137] A. Anders, R.A. MacGill, Twist ﬁlter for the removal of macroparticles from cathodic arc plasmas, Surf.

Coat. Technol. 133–134 (2000) 96–100.

[138] A. Anders, Approaches to rid cathodic arc plasma of macro- and nanoparticles: a review, Surf. Coat.

Technol. 120–121 (1999) 319–330.

[139] J.S. Colligon, Energetic condensation: processes, properties, and products, J. Vac. Sci. Technol. A 13 (1995)

1649–1657.

[140] I.G. Brown, Cathodic arc deposition of ﬁlms, Annu. Rev. Mater. Sci. 28 (1998) 243–269.

[141] O.R. Monteiro, Thin ﬁlm synthesis by energetic condensation, Annu. Rev. Mater. Sci. 31 (2001) 111–137.

[142] M. Nastasi, J.W. Mayer, J.K. Hirvonen, Ion–Solid Interactions, Cambridge University Press, Cambridge

(1996).

[143] S. Uhlmann, T. Fraunheim, Y. Lifshitz, Molecular-dynamics study of the fundamental processes involved in

subplantation of diamondlike carbon, Phys. Rev. Lett. 81 (1998) 641–644.

[144] Y. Lifshitz, S.R. Kasai, J.W. Rabalais, W. Eckstein, Subplantation model for ﬁlm growth from hyperthermal

species, Phys. Rev. B 41 (1990) 10468–10480.

[145] C. Ronning, Ion-beam synthesis and growth mechanism of diamond-like materials, Appl. Phys. A 77 (2003)

39–50.

[146] A. Anders (Ed.), Handbook of Plasma Immersion Ion Implantation and Deposition, John Wiley & Sons,

New York (2000).

[147] T.A. Carlson, C.W. Nestor, N. Wasserman, J.D. McDowell, Calculated ionization potentials for multiply

charges ions, Atomic Data 2 (1970) 63–99.

[148] D.R. Lide (Ed.), Handbook of Chemistry and Physics, 81st ed., CRC Press, Boca Raton, New York (2000).

[149] J. Musil, Hard and superhard nanocomposite coatings, Surf. Coat. Technol. 125 (2000) 322–330.

[150] A. Anders, Atomic scale heating in cathodic arc plasma deposition, Appl. Phys. Lett. 80 (2002) 1100–1102.

[151] M. Nastasi, J.M. Mayer, Ion Implantation and Synthesis of Materials, Springer, Berlin (2006).

[152] M.M.M. Bilek, D.R. McKenzie, A comprehensive model of stress generation and relief processes in thin

ﬁlms deposited with energetic ions, Surf. Coat. Technol. 200 (2006) 4345–4354.

[153] M.M.M. Bilek, R.N. Tarrant, D.R. McKenzie, S.H.N. Lim, D.G. McCulloch, Control of stress and

microstructure in cathodic arc deposited ﬁlms, IEEE Trans. Plasma Sci. 31 (2003) 939–944.

Unﬁltered and Filtered Cathodic Arc Deposition 525

[154] S.H.N. Lim, D.G. McCulloch, M.M.M. Bilek, D.R. McKenzie, Minimisation of intrinsic stress in titanium

nitride using a cathodic arc with plasma immersion ion implantation, Surf. Coat. Technol. 174–175 (2003)

76–80.

[155] C.A. Davis, A simple model for the formation of compressive stress in thin ﬁlms by ion bombardment, Thin

Solid Films 226 (1993) 30–34.

[156] H. Windischmann, An intrinsic stress scaling law for polycrystalline thin ﬁlms prepared by ion beam

sputtering, J. Appl. Phys 62 (1987) 1800–1807.

[157] N.A. Marks, Evidence for subpicosecond thermal spikes in the formation of tetrahedral amorphous carbon,

Phys. Rev. B 56 (1997) 2441.

[158] M.M.M. Bilek, D.R. McKenzie, W. Moeller, Use of low energy and high frequency PBII during thin ﬁlm

deposition to achieve relief of intrinsic stress and microstructural changes, Surf. Coat. Technol. 186 (2004)

21–28.

[159] B. Abendroth, R. Gago, A. Kolitsch, W. Moller, Stress measurement and stress relaxation during magnetron

sputter deposition of cubic boron nitride thin ﬁlms, Thin Solid Films 447–448 (2004) 131–135.

[160] Y. Yin, D. McKenzie, M. Bilek, Intrinsic stress induced by substrate bias in amorphous hydrogenated silicon

thin ﬁlms, Surf. Coat. Technol. 198 (2005) 156–160.

[161] J. Houska, J. Capek, J. Vlcek, M.M.M. Bilek, D.R. McKenzie, Bonding statistics and electronic structure of

novel Si–B–C–N materials: ab initio calculations and experimental veriﬁcation, J. Vac. Sci. Technol. A 25

(2007) 1411–1416.

[162] M.M.M. Bilek, M. Verdon, L. Ryves, T.W.H. Oates, C.T. Ha, D.R. McKenzie, A model for stress generation

and stress relief mechanisms applied to as-deposited ﬁltered cathodic vacuum arc amorphous carbon ﬁlms,

Thin Solid Films 482 (2005) 69–73.

[163] H. Hofs

ass, H. Feldermann, R. Merk, M. Sebastian, C. Ronning, Cylindrical spike model for the formation

of diamondlike thin ﬁlms by ion deposition, Appl. Phys. A: Mater. Sci. Process. 66 (1998) 153–181.

[164] M. Krohn, K.-P. Meyer, H. Bethge, Epitaxy by vacuum arc evaporation, J. Crystal Growth 64 (1983)

326–332.

[165] E. Byon, T.H. Oates, A. Anders, Coalescence of nanometer silver islands on oxides grown by ﬁltered

cathodic arc deposition, Appl. Phys. Lett. 82 (2003) 1634–1636.

[166] T. Oates, D. McKenzie, M. Bilek, Percolation threshold in ultrathin titanium ﬁlms determined by in-situ

spectroscopic ellipsometry, Phys. Rev. B 70 (2004) 195406.

[167] H. Arwin, D.E. Aspnes, Unambiguous determination of thickness and dielectric function of thin ﬁlms by

spectroscopic ellipsometry, Thin Solid Films 113 (1984) 101–113.

[168] J.F. Ziegler, J. Biersack, Monte Carlo code SRIM2006.02, downloadable from: <http://srim.org/> (2006).

[169] J.-O. Andersson, B. Sundman, Thermodynamic properties of the Cr–Fe system, Calphad 11 (1987)

83–92.

[170] I.I. Aksenov, V.A. Belous, V.G. Padalka, V.M. Khoroshikh, Producing coatings with aluminium oxide base

from separated ﬂow of vacuum arc plasma, Fizika i Khimiya Obrabotki Materialov (1977) 89–93.

[171] C. Bergman, Arc plasma physical vapor deposition, in: 28th Annual SVC Technical Conference,

Philadelphia, PA (1985) 175–191.

[172] W.-D. M

unz, D. Schulze, F.J.M. Hauzer, A new method for hard coatings – ABS (arc bond sputtering), Surf.

Coat. Technol. 50 (1992) 169–178.

[173] C. Sch

onjahn, A.P. Ehiasarian, D.B. Lewis, R. New, W.-D. M

unz, R.D. Twesten, I. Petrov, Optimization of

in-situ substrate treatment in a cathodic arc plasma: A study by TEM and plasma diagnostics, J. Vac. Sci.

Technol. A 19 (2001) 1415–1420.

[174] A.P. Ehiasarian, P.E. Hovsepian, L. Hultman, U. Helmersson, Comparison of microstructure and mechanical

properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by

the combined steered cathodic arc/unbalanced magnetron technique, Thin Solid Films 457 (2004) 270–277.

[175] D.B. Lewis, D. Reitz, C. W

ustefeld, R. Ohser-Wiedemann, H. Oettel, A.P. Ehiasarian, P.E. Hovsepian,

Chromium nitride/niobium nitride nano-scale multilayer coatings deposited at low temperature by the

combined cathodic arc/unbalanced magnetron technique, Thin Solid Films 503 (2006) 133–142.

526 Chapter 10

[176] I.I. Aksenov, A.A. Andreev, Vacuum arc coating technologies at NSC KIPT, Problems Atomic Sci.

Technol., Series: Plasma Physics 3 (1999) 242.

[177] P.C. Johnson, Cathodic arc plasma deposition processes and their applications, in: 30th Annual SVC

Technical Conference (1987) 317–324.

[178] B. Rother, J. Vetter, Plasmabeschichtungsverfahren und Hartstoffschichten, Deutscher Verlag f

Grundstofﬁndustrie, Leipzig (1992).

[179] K.W. Mertz, H.A. Jehn (Eds.), Praxishandbuch moderne Beschichtungen, Carl Hanser Verlag, M

unchen

(2001).

[180] A. Anders, A brief modern history of cathodic arc coating, in: D.M. Mattox, V. Harwood Mattox (Eds.), 50

Years of Vacuum coating and the Growth of the Society of Vacuum Coaters, Society of Vacuum Coaters,

Albuquerque, NM (2007) 120–131.

[181] J. Vetter, R. Knaup, H. Dwuletzki, E. Schneider, S. Vogler, Hard coatings for lubrication reduction in metal

forming, Surf. Coat. Technol. 86–87 (1996) 739–746.

[182] O.A. Johansen, J.H. Dontje, R.L.D. Zenner, Reactive arc vapor ion deposition of TiN, ZrN and HfN, Thin

Solid Films 153 (1987) 75–82.

[183] P.C. Johnson, H. Randhawa, Zirconium nitride ﬁlms prepared by cathodic arc plasma deposition process,

Surf. Coat. Technol. 33 (1987) 53–62.

[184] J. Vetter, (Al

:Ti

)N coatings deposited by cathodic vacuum arc evaporation, J. Adv. Mater. 31 (1999) 41–47.

[185] H. Freller, H. Haessler, Ti

1−x

N ﬁlms deposited by ion plating with an arc evaporator, Thin Solid Films

153 (1987) 67–74.

[186] A. H

orling, L. Hultman, M. Od

en, J. Sj

en, L. Karlsson, Mechanical properties and machining performance

of Ti

1−x

N-coated cutting tools, Surf. Coat. Technol. 191 (2005) 384–392.

[187] J.I. Gersten, F.W. Smith, The Physics and Chemistry of Materials, John Wiley & Sons, New York (2001).

[188] A. H

orling, L. Hultman, M. Od

en, J. Sjol

en, L. Karlsson, Thermal stability of arc evaporated high

aluminum-content Ti

1−x

N thin ﬁlms, J. Vac. Sci. Technol. A 20 (2002) 1815–1823.

[189] P.H. Mayrhofer, A. H

orling, L. Karlsson, J. Sjolen, T. Larsson, C. Mitterer, L. Hultman, Self-organized

nanostructures in the Ti–Al–N system, Appl. Phys. Lett. 83 (2003) 2049–2051.

[190] O. Knotek, F. Lofﬂer, H.J. Scholl, C. Barimani, The multisource arc process for depositing ternary Cr- and

Ti-based coatings, Surf. Coat. Technol. 68–69 (1994) 309–313.

[191] J. Vetter, H.J. Scholl, O. Knotek, (TiCr)N coatings deposited by cathodic vacuum arc evaporation, Surf.

Coat. Technol. 74–75 (1995) 286–291.

[192] S. Boelens, H. Veltrop, Hard coatings of TiN (TiHf)N and (TiNb)N deposited by random and steered arc

evaporation, Surf. Coat. Technol. 33 (1987) 63–71.

[193] L. Karlsson, L. Hultman, M.P. Johansson, J.E. Sundgren, H. Ljungcrantz, Growth, microstructure and

mechanical properties of arc evaporated TiC

1−x

(0<=x:<=1)ﬁlms, Surf. Coat. Technol. 126 (2000)

1–14.

[194] L. Karlsson, L. Hultman, J.E. Sundgren, Inﬂuence of residual stresses on the mechanical properties of

TiC

1−x

(x = 0, 0.15, 0.45) thin ﬁlms deposited by arc evaporation, Thin Solid Films 371 (2000) 167–177.

[195] Y.-Y. Chang, S.-J. Yang, D.-Y. Wang, Characterization of TiCr(C,N)/amorphous carbon coatings

synthesized by a cathodic arc deposition process, Thin Solid Films 515 (2007) 4722–4726.

[196] K. Yamamoto, T. Sato, K. Takahara, K. Hanaguri, Properties of (Ti,Cr,AI)N coatings with high Al content

deposited by new plasma enhanced arc-cathode, Surf. Coat. Technol. 174–175 (2003) 620–626.

[197] C.-L. Chang, W.-C. Chen, P.-C. Tsai, W.-Y. Ho, D.-Y. Wang, Characteristics and performance of

TiSiN/TiAlN multilayers coating synthesized by cathodic arc plasma evaporation, Surf. Coat. Technol. 202

(2007) 987–992.

[198] S.-Y. Chun, A. Chayahara, Pulsed vacuum arc deposition of multilayers in the nanometer range, Surf. Coat.

Technol. 132 (2000) 217–221.

[199] G.S. Fox-Rabinovich, K. Yamamoto, S.C. Veldhuis, A.I. Kovalev, L.S. Shuster, L. Ning, Self-adaptive wear

behavior of nano-multilayered TiAlCrN/WN coatings under severe machining conditions, Surf. Coat.

Technol. 201 (2006) 1852–1860.

Unﬁltered and Filtered Cathodic Arc Deposition 527

[200] V. Gorokhovsky, B. Heckerman, P. Watson, N. Bekesch, The effect of multilayer ﬁltered arc coatings on

mechanical properties, corrosion resistance and performance of periodontal dental instruments, Surf. Coat.

Technol. 200 (2006) 5614–5630.

[201] P.E. Hovsepian, D.B. Lewis, Q. Luo, W.-D. Munz, P.H. Mayrhofer, C. Mitterer et al., TiAlN based

nanoscale multilayer coatings designed to adapt their tribological properties at elevated temperatures, Thin

Solid Films 485 (2005) 160–168.

[202] O. Knotek, E. Lugscheider, F. L

ofﬂer, W. Beele, C. Barimani, Arc evaporation of multicomponent MCrAlY

cathodes, Surf. Coat. Technol. 74/75 (1995) 118–122.

[203] D.R. McKenzie, R.N. Tarrant, M.M.M. Bilek et al., Multilayered carbon ﬁlms for tribological applications,

Diamond Rel. Mater. 12 (2003) 178–184.

[204] L. Ryves, M.M.M. Bilek, T.W.H. Oates, R.N. Tarrant, D.R. McKenzie, F.A. Burgmann, D.G. McCulloch,

Synthesis and in-situ ellipsometric monitoring of Ti/C nanostructured multilayers using a high-current, dual

source pulsed cathodic arc, Thin Solid Films 482 (2005) 133–137.

[205] S.B. Sant, K.S. Gill, Growth and characterization of cathodic arc evaporated CrN (TiAl)N and (TiZr)N ﬁlms,

Surf. Coat. Technol. 68–69 (1994) 152–156.

[206] H.J. Scheibe, W. Pompe, P. Siemroth, B. Buecken, D. Schulze, R. Wilberg, Preparation of multilayers ﬁlms

structures by laser arcs, Surf. Coat. Technol. 193–194 (1990) 788–798.

[207] J. Vetter, W. Burgmer, H.G. Dederichs, A.J. Perry, The architecture and performance of multilayer and

compositionally gradient coatings made by cathodic arc evaporation, Surf. Coat. Technol. 61 (1993)

209–214.

[208] J. Vetter, T. Krug, V. von der Heide, AlTiCrNO coatings for dry cutting deposited by reactive cathodic

vacuum arc evaporation, Surf. Coat. Technol. 174 (2003) 615–619.

[209] F.R. Weber, F. Fontaine, M. Scheib, W. Bock, Cathodic arc evaporation of (Ti, Al)N coatings and

(Ti,Al)N/TiN multilayer-coatings – correlation between lifetime of coated cutting tools, structural and

mechanical ﬁlm properties, Surf. Coat. Technol. 177–178 (2004) 227–232.

[210] H. Ziegele, C. Rebholz, H.J. Scheibe, B. Schultrich, A. Matthews, Mechanical and tribological properties of

hard aluminium–carbon multilayer ﬁlms prepared by the laser-arc technique, Surf. Coat. Technol. 107

(1998) 159–167.

[211] S. Anders, D.L. Callahan, G.M. Pharr, T.Y. Tsui, C.S. Bhatia, Multilayers of amorphous carbon prepared by

cathodic arc deposition, Surf. Coat. Technol. 94/95 (1997) 189–194.

[212] D.G. McCulloch, X.L. Xiao, J.L. Peng, P.C.T. Ha, D.R. McKenzie, M.M.M. Bilek et al., The structure and

annealing properties of multilayer carbon ﬁlms, Surf. Coat. Technol. 198 (2005) 217–222.

[213] H.Y. Lee, J.G. Han, S.H. Baeg, S.H. Yang, Characterization of WC-CrAlN heterostructures obtained using a

cathodic arc ion plating process, Surf. Coat. Technol. 174–175 (2003) 303–309.

[214] A. Schlegel, P. Wachter, J.J. Nickl, H. Lingg, Optical properties of TiN and ZrN, J. Phys. C: Solid State

Phys. (1977) 4889–4896.

[215] S. Niyomsoan, W. Grant, D.L. Olson, B. Mishra, Variation of color in titanium and zirconium nitride

decorative thin ﬁlms, Thin Solid Films 415 (2002) 187–194.

[216] M. Eerden, W. van Ijzendoorn, R. Tietema, G.J. van der Kolk, A systematic study of the properties of the

Zr–C–N ternary system, deposited by reactive arc evaporation, in: 46th Annual Technical Conference,

Society of Vacuum Coaters, San Francisco, CA (2003) 56–60.

[217] U. Beck, G. Reiners, U. Kopacz, H.A. Jehn, Decorative hard coatings: interdependence of optical,

stoichiometric and structural properties, Surf. Coat. Technol. 60 (1993) 389–395.

[218] R. Lossy, D.L. Pappas, R.A. Roy, J.J. Cuomo, V.H. Sura, Filtered arc deposition of amorphous diamond,

Appl. Phys. Lett. 61 (1992) 171–173.

[219] S. Falabella, D.B. Boercker, D.M. Sanders, Fabrication of amorphous diamond ﬁlms, Thin Solid Films 236

(1993) 82–86.

[220] X. Wang, J.P. Zhao, Z.Y. Chen, S.Q. Yang, T.S. Shi, X.H. Liu, Field emission from amorphous diamond

ﬁlms prepared by ﬁltered arc deposition, Thin Solid Films 317 (1998) 356–358.

528 Chapter 10

[221] C.A. Davis, V.S. Veerasamy, G.A.J. Amaratunga, W.I. Milne, D.R. McKenzie, Properties of tetrahedral

amorphous carbon ﬁlms deposited in a ﬁltered cathodic arc in the presence of hydrogen, Phil. Mag. B 69

(1994) 1121–1131.

[222] A. Stanishevsky, L. Khriachtchev, I. Akula, Deposition of carbon ﬁlms containing nitrogen by ﬁltered

pulsed cathodic arc discharge method, Diamond Rel. Mater. 7 (1998) 1190–1195.

[223] B. Druz, Y. Yevtukhov, V. Novotny, I. Zaritsky, V. Kanarov, V. Polyakov, A. Rukavishnikov, Nitrogenated

carbon ﬁlms deposited using ﬁltered cathodic arc, Diamond Rel. Mater. 9 (2000) 668–674.

[224] M. K

uhn, C. Spaeth, R. Pintaske, S. Peter, F. Richter, A. Anders, The effect of additional ion/plasma

assistance in CNx-ﬁlm deposition based on a ﬁltered cathodic arc, Thin Solid Films 311 (1997) 151–156.

[225] E. Liu, X. Shi, H.S. Tan, L.K. Cheah, Z. Sun, B.K. Tay, J.R. Shi, The effect of nitrogen on the mechanical

properties of tetrahedral amorphous carbon ﬁlms deposited with a ﬁltered cathodic vacuum arc, Surf. Coat.

Technol. 120–121 (1999) 601–606.

[226] J.P. Zhao, X. Wang, Z.Y. Chen, S.Q. Yang, T.S. Shi, X.H. Liu, Amorphous carbon and carbon nitride ﬁlms

prepared by ﬁltered arc deposition and ion assisted arc deposition, Mater. Lett. 33 (1997) 41–45.

[227] P. Zhang, B.K. Tay, G.Q. Yu, S.P. Lau, Y.Q. Fu, Surface energy of metal containing amorphous carbon ﬁlms

deposited by ﬁltered cathodic vacuum arc, Diamond Rel. Mater. 13 (2004) 459–464.

[228] A. Anders, N. Pasaja, S. Sansongsiri, Filtered cathodic arc deposition with ion-species-selective bias, Rev.

Sci. Instrum. 78 (2007) 063901-1–5.

[229] D.R. McKenzie, Tetrahedral bonding in amorphous carbon, Rep. Prog. Phys. 59 (1996) 1611–1664.

[230] A. Erdemir, C. Donnet, Tribology of diamondlike carbon ﬁlms: recent progress and future prospects,

J. Phys. D: Appl. Phys. 39 (2006) R1–R17.

[231] J. Robertson, Diamond-like amorphous carbon, Mater. Sci. Eng. R 37 (2002) 129–281.

[232] V.E. Strel’nitskii, I.I. Aksenov, S.I. Vakula, V.G. Padalka, V.A. Belous, Properties of diamond-like carbon

coating produced by plasma condensation, Sov. Techn. Phys. Lett. 4 (1978) 546–547.

[233] S.I. Vakula, V.G. Padalka, V.E. Strel’nitskii, A.I. Usoskin, Optical properties of diamond-like carbon ﬁlms,

Sov. Techn. Phys. Lett. 5 (1979) 573–574.

[234] I.I. Aksenov, S.I. Vakula, V.G. Padalka, V.E. Strel’nitskii, V.M. Khoroshikh, High-efﬁciency source of pure

carbon plasma, Sov. Phys. Techn. Phys. 25 (1980) 1164–1166.

[235] J.J. Cuomo, D.L. Pappas, J. Bruley, J.P. Doyle, K.K. Saenger, Vapor deposition process for amorphous

carbon ﬁlms with sp

fractions approaching diamond, J. Appl. Phys. 70 (1991) 1706–1711.

[236] V.S. Veerasamy, G.A.J. Amaratunga, C.A. Davis, W.I. Milne, P. Hewitt, M. Weiler, Electronic density of

states in highly tetrahedral amorphous carbon, Solid State Electron. 37 (1994) 319–326.

[237] M. Chhowalla, J. Robertson, C.W. Chen, S.R.P. Silva, C.A. Davis, G.A.J. Amaratunga, W.I. Milne,

Inﬂuence of ion energies and substrate temperature on the optical and electronic properties of tetrahedral

amorphous carbon (ta-C) ﬁlms, J. Appl. Phys. 81 (1997) 139–145.

[238] L.K. Cheah, X. Shi, E. Liu, B.K. Tay, J.R. Shi, Z. Sun, Inﬂuence of hydrogen on the structure and properties

of tetrahedral amorphous carbon ﬁlms obtained by the ﬁltered cathodic vacuum arc technique, Phil. Mag. B

79 (1999) 1647–1658.

[239] G.M. Pharr, D.L. Callahan, D. McAdams et al., Hardness, elastic modulus, and structure of very hard carbon

ﬁlms produced by cathodic-arc deposition with substrate bias, Appl. Phys. Lett. 68 (1996) 779–781.

[240] J.Y. Sze, B.K. Tay, D. Sheeja, S.P. Lau, Y.Q. Fu, D.H.C. Chua, W.I. Milne, Optical and electrical properties

of amorphous carbon ﬁlms deposited using ﬁltered cathodic vacuum arc with pulse biasing, Thin Solid

Films 447 (2004) 148–152.

[241] B. Bhushan, B.K. Gupta, R. Sundaram, S. Dey, S. Anders, A. Anders et al., Development of hard carbon

coatings for thin-ﬁlm tape heads, IEEE Trans. Magnet. 31 (1995) 2976–2978.

[242] J. Robertson, Ultrathin carbon coatings for magnetic storage technology, Thin Solid Films 383 (2001) 81–88.

[243] A. Anders, F.R. Ryan, Ultrathin ta-C ﬁlms on heads deposited by twist-ﬁltered cathodic arc carbon deposition

(invited), Symposium on Interface Tribology Towards 100 Gbit/in

and Beyond, Seattle, WA (2000) 43–50.

[244] B. Druz, Y. Yevtukhov, I. Zaritskiy, Diamond-like carbon overcoat for TFMH using ﬁltered cathodic arc

system with Ar-assisted arc discharge, Diamond Rel. Materials 14 (2005) 1508–1516.

Unﬁltered and Filtered Cathodic Arc Deposition 529

[245] H.J. Scheibe, B. Schultrich, R. Wilberg, M. Falz, Laser-arc technology for industrial hard coating deposition,

Surf. Coat. Technol. 97 (1997) 410–413.

[246] M. Ikeyama, S. Nakao, Y. Miyagawa, S. Miyagawa, Effects of Si content in DLC ﬁlms on their friction and

wear properties, Surf. Coat. Technol. 191 (2005) 38–42.

[247] B.K. Tay, D. Sheeja, L.J. Yu, On stress reduction of tetrahedral amorphous carbon ﬁlms for moving

mechanical assemblies, Diamond Rel. Mater. 12 (2003) 185–194.

[248] D. Sheeja, B.K. Tay, S.P. Lau, L.N. Nung, Tribological characterisation of diamond-like carbon coatings on

Co–Cr–Mo alloy for orthopaedic applications, Surf. Coat. Technol. 146–147 (2001) 410–416.

[249] R. Hauert, A review of modiﬁed DLC coatings for biological applications, Diamond Rel. Mater. 12 (2003)

583–589.

[250] S.C.H. Kwok, W. Zhang, G.J. Wan, D.R. McKenzie, M.M.M. Bilek, P.K. Chu, Hemocompatibility and

anti-bacterial properties of silver doped diamond-like carbon prepared by pulsed ﬁltered cathodic vacuum

arc deposition, Diamond Rel. Mater. 16 (2007) 1353–1360.

[251] A. Anders, N. Pasaja, S.H.N. Lim, T.C. Petersen, V.J. Keast, Plasma biasing to control the growth

conditions of diamond-like carbon, Surf. Coat. Technol. 201 (2007) 4628–4632.

[252] T.A. Friedmann, J.P. Sullivan, J.A. Knapp, D.R. Tallant, D.M. Follstaedt, D.L. Medlin, P.B. Mirkarimi,

Thick stress-free amorphous-tetrahedral carbon ﬁlms with hardness near that of diamond, Appl. Phys. Lett.

71 (1997) 3820–3822.

[253] O.R. Monteiro, J.W. Ager III, D.H. Lee, R.Y. Lo, K.C. Walter, M. Nastasi, Annealing of nonhydrogenated

amophous carbon ﬁlms prepared by ﬁltered cathodic arc, J. Appl. Phys. 88 (2000) 2395–2399.

[254] Z. Tang, Z.J. Zhang, K. Narumi, Y. Xu, H. Naramoto, S. Nagai, K. Miyashita, Effect of mass-selected ion

species on structure and properties of diamond-like carbon ﬁlms, J. Appl. Phys. 89 (2001) 1959–1964.

[255] J. Robertson, Mechanical properties and coordinations of amorphous carbons, Phys. Rev. Lett 68 (1992)

220.

[256] R. Gago, M. Vinnichenko, H.U. Jager, A.Y. Belov, I. Jimenez, N. Huang et al., Evolution of sp

networks

with substrate temperature in amorphous carbon ﬁlms: experiment and theory, Phys. Rev. B 72 (2005)

014120–14129.

[257] R.N. Tarrant, C.S. Montross, D.R. McKenzie, Combined deposition and implantation in the cathodic arc for

thick ﬁlm preparation, Surf. Coat. Technol. 136 (2001) 188–191.

[258] R.N. Tarrant, N. Fujisawa, M.V. Swain, N.L. James, D.R. McKenzie, J.C. Woodard, PBII deposition of thick

carbon coatings from a cathodic arc plasma, Surf. Coat. Technol. 156 (2002) 143–148.

[259] P. Siemroth, C. Wenzel, W. Kliomes, B. Schultrich, T. Sch

ulke, Metallization of sub-micron trenches and

vias with high aspect ratio, Thin Solid Films 308 (1997) 455–459.

[260] P. Siemroth, T. Sch

ulke, Copper metallization in microelectronics using ﬁltered vacuum arc deposition –

principles and technological development, Surf. Coat. Technol. 133–134 (2000) 106–113.

[261] O.R. Monteiro, Novel metallization technique for ﬁlling 100-nm-wide trenches and vias with very high

aspect ratio, J. Vac. Sci. Technol. B 17 (1999) 1094–1097.

[262] U.-S. Chen, H.C. Shih, Characterization of copper metallization for interconnect by 90[deg]-bend

electromagnetic ﬁltered vacuum arc, Nucl. Instrum. Meth. Phys. Res. B 237 (2005) 477–483.

[263] A. Bendavid, P.J. Martin, A. Jamting, H. Takikawa, Structural and optical properties of titanium oxide thin

ﬁlms deposited by ﬁltered arc deposition, Thin Solid Films 356 (1999) 6–11.

[264] P.J. Martin, R.P. Netterﬁeld, T.J. Kinder, Ion-beam-deposited ﬁlms produced by ﬁltered arc evaporation,

Thin Solid Films 193 (1990) 77–83.

[265] P.J. Martin, R.P. Netterﬁeld, T.J. Kinder, L. Descotes, Deposition of TiN, TiC, and TiO

ﬁlms by ﬁltered arc

evaporation, Surf. Coat. Technol. 49 (1991) 239–243.

[266] P.J. Martin, A. Bendavid, R.P. Netterﬁeld, T.J. Kinder, F. Jahan, G. Smith, Plasma deposition of tribological

and optical thin ﬁlm materials with a ﬁltered cathodic arc source, Surf. Coat. Technol. 112 (1999)

257–260.

[267] A. Bendavid, P.J. Martin, H. Takikawa, Deposition and modiﬁcation of titanium dioxide thin ﬁlms by

ﬁltered arc deposition, Thin Solid Films 360 (2000) 241–249.

530 Chapter 10

[268] J.K. Kim, E.S. Lee, D.H. Kim, D.G. Kim, Ion beam-induced erosion and humidity effect of MgO protective

layer prepared by vacuum arc deposition, Thin Solid Films 447 (2004) 95–99.

[269] C. Zheng, D. Zhu, D. Chen, Z. He, L. Wen, W.Y. Cheung, S.P. Wong, Inﬂuence of O

ﬂow rate on structure

and properties of MgO

ﬁlms prepared by cathodic-vacuum-arc ion deposition system, IEEE Trans. Plasma

Sci. 34 (2006) 1099–1104.

[270] B.K. Tay, Z.W. Zhao, C.Q. Sun, Effects of substrate bias and growth temperature on properties of aluminium

oxide thin ﬁlms by using ﬁltered cathodic vacuum arc, Surf. Coat. Technol. 198 (2005) 94–97.

[271] J. Ros

en, S. Mr

az, U. Kreissig, D. Music, J.M. Schneider, Effect of ion energy on structure and composition

of cathodic arc deposited alumina thin ﬁlms, Plasma Chem. Plasma Process. 25 (2005) 303–317.

[272] S. M

andl, D. Manova, B. Rauschenbach, Transparent AlN layers formed by metal plasma immersion ion

implantation and deposition, Surf. Coat. Technol. 186 (2004) 82–87.

[273] V.N. Inkin, G.G. Kirpilenko, A.J. Kolpakov, Properties of aluminium nitride coating obtained by vacuum

arc discharge method with plasma ﬂow separation, Diamond Rel. Mater. 10 (2001) 1314–1316.

[274] A.J.-C. Wen, K.-L. Chen, M.-H. Yang, W.-T. Hsiao, L.-G. Chao, M.-S. Leu, Effect of substrate angle on

properties of ITO ﬁlms deposited by cathodic arc ion plating with In–Sn alloy target, Surf. Coat. Technol.

198 (2005) 362–366.

[275] T. Minami, S. Ida, T. Miyata, High rate deposition of transparent conducting oxide thin ﬁlms by vacuum arc

plasma evaporation, Thin Solid Films 416 (2002) 92–96.

[276] T. David, S. Goldsmith, R.L. Boxman, p-type Sb-doped ZnO thin ﬁlms prepared with ﬁltered vacuum arc

deposition, in: 47th Annual Technical Conference Proceedings of the Society of Vacuum Coaters, Dallas,

TX (2004) 122–126.

[277] D.C. Look, B. Claﬂin, Y.I. Alivov, S.J. Park, The future of ZnO light emitters, Phys. Stat. Sol. (A) 201

(2004) 2203–2212.

[278] A. Ben-Shalom, L. Kaplan, R.L. Boxman, S. Goldsmith, M. Nathan, SnO

transparent conductor ﬁlms

produced by ﬁltered vacuum arc deposition, Thin Solid Films 236 (1993) 20–26.

[279] R.L. Boxman, V. Zhitomirsky, S. Goldsmith, T. David, V. Dikhtyar, Deposition of SnO

coatings using a

rectangular ﬁltered vacuum arc source, in: 46th Annual Technical Meeting of the Society of Vacuum

Coaters, San Francisco, CA (2003) 234–239.

[280] L. Kaplan, A. Benshalom, R.L. Boxman, S. Goldsmith, U. Rosenberg, M. Nathan, Annealing and Sb-doping

of Sn–O ﬁlms produced by ﬁltered vacuum arc deposition – structure and electro-optical properties, Thin

Solid Films 253 (1994) 1–8.

[281] L. Kaplan, V.N. Zhitomirsky, S. Goldsmith, R.L. Boxman, I. Rusman, Arc behaviour during ﬁltered vacuum

arc deposition of Sn–O thin ﬁlms, Surf. Coat. Technol. 76 (1995) 181–189.

[282] L. Kaplan, I. Rusman, R.L. Boxman, S. Goldsmith, M. Nathan, E. BenJacob, STM and XPS study of ﬁltered

vacuum arc deposited Sn–O ﬁlms, Thin Solid Films 291 (1996) 355–361.

[283] V.N. Zhitomirsky, R.L. Boxman, S. Goldsmith, Plasma distribution and SnO

coating deposition using a

rectangular ﬁltered vacuum arc plasma source, Surf. Coat. Technol. 185 (2004) 1–11.

[284] V.N. Zhitomirsky, T. David, R.L. Boxman, S. Goldsmith, A. Verdyan, Y.M. Soifer, L. Rapoport, Properties

of SnO

coatings fabricated on polymer substrates using ﬁltered vacuum arc deposition, Thin Solid Films

492 (2005) 187–194.

[285] S. Goldsmith, Filtered vacuum arc deposition of undoped and doped ZnO thin ﬁlms: Electrical, optical, and

structural properties, Surf. Coat. Technol. 201 (2006) 3993–3999.

[286] X.L. Xu, S.P. Lau, J.S. Chen, G.Y. Chen, B.K. Tay, Polycrystalline ZnO thin ﬁlms on Si (100) deposited by

ﬁltered cathodic vacuum arc, J. Crystal Growth 223 (2001) 201–205.

[287] X.L. Xu, S.P. Lau, B.K. Tay, Structural and optical properties of ZnO thin ﬁlms produced by ﬁltered

cathodic vacuum arc, Thin Solid Films 398-399 (2001) 244–249.

[288] B.K. Tay, Z.W. Zhao, D.H.C. Chua, Review of metal oxide ﬁlms deposited by ﬁltered cathodic vacuum arc

technique, Mater. Sci. Eng. R: Reports 52 (2006) 1–48.

[289] H.W. Lee, S.P. Lau, Y.G. Wang, B.K. Tay, H.H. Hng, Internal stress and surface morphology of zinc oxide

thin ﬁlms deposited by ﬁltered cathodic vacuum arc technique, Thin Solid Films 458 (2004) 15–19.