48 Helmut Mehrer
The A sublattice in D0
3
structure compounds is interconnected by nearest-
neighbour bonds, whereas this is not the case for the B sublattice (see
Fig. 1.22). Thus the A atoms can diffuse within their own sublattice via
nearest-neighbour (NN) jumps. If B atoms migrate within their own sublat-
tice, their jump vector corresponds to a third-nearest neighbour jump with
respect to the bcc unit cell. An alternative for the diffusion of B atoms are
nearest-neighbour jumps which, however, create B antisite defects. Both op-
tions are very likely associated with higher activation enthalpies for diffusion
of B atoms compared to A atoms. Those D0
3
compounds (Fe
3
Si, Cu
3
Sn, see
Table 1.4), for which reliable diffusion data for both constituents are available,
indeed fulfill this rule [63]. In L1
2
compounds each A atom is surrounded by
8 A atoms and 4 B atoms on nearest-neighbour sites (see Fig. 1.22). In con-
trast to this situation, a B atom faces only A atoms on surrounding nearest-
neighbour sites. This implies that similar to the D0
3
structure the sublattice
of the majority component A is interconnected by nearest-neighbour bonds,
whereas this is not the case for the sublattice of the minority component B.
Vacancy motion restricted to the majority sublattice can promote diffusion
of A atoms. However, diffusion of B atoms either requires jump lengths larger
than the nearest-neighbour distance or the formation of antisite defects, if it
is promoted by NN jumps of vacancies.
As can be seen from Fig. 1.25, diffusion of the majority component Ni
in Ni
3
Ge is indeed significantly faster than that of the minority component
Ge. Experiments on Ni
3
Ga revealed that the trend is similar to the case of
Ni
3
Ge, but the difference of the diffusivities is not so large [81].
For the technologically important compound Ni
3
Al no unquestioned data
of Al diffusion are available [62,63]. There are, however, indications that the
ratio of the two diffusion coefficients is not far from unity [64]. It is quite
natural that Ni diffusion in L1
2
compounds occurs by a sublattice vacancy
mechanism. On the other hand, it is not clear how the diffusion of the minor-
ity elements occurs in Ni based L1
2
compounds. Possible mechanisms have
been discussed in [64]. Most likely minority elements diffuse as antisite atoms
in the majority sublattice. Thus the Cu
3
Au rule should not be considered to
be universal. A compound which is a beautiful example for the validity of the
rule is MoSi
2
. Tracer diffusion studies of Si and Mo diffusion revealed a huge
asymmetry between the diffusion of the majority and the minority compo-
nent. Si diffusion is 6 to 7 orders of magnitude faster than Mo diffusion [82].
It is interesting to note that MoSi
2
is one of the compounds on which the
formulation of the rule was based to interpret silicide formation from thin
Mo layers on Si wafers [80].