
Nanostructures Fabricated
by
Physical Techniques
327
151.
H.
Schift, C. David, J. Gobrecht, A.D. Amore, D. Simoneta, W. Kaiser, and
152.
I.
Maximov, P. Carlberg, D. Wallin,
I.
Shorubalko, W. Seifert, H.Q. Xu, L. Montelius,
153.
R.D. Piner, J. Zhu,
F.
Xu,
S.
Hong, and C.A. Mirkin,
Science
283,661 (1 999).
154.
S.
Hong, J. Zhu, and C.A. Mirkin,
Science
286, 523 (1 999).
155.
C.A. Mirkin,
hop.
Chem.
39,2258 (2000).
156.
Z.L.
Wang (ed.),
Characterization
of
Nanophase Materials,
Wiley-VCH, New York,
157.
J.Z. Zhang, J. Liu, Z.L. Wang, S.W. Chen, and G.Y. Liu,
ChemistryofSelf-Assembled
158.
D.N. Reinhoudt,
Supermolecular Technology,
John Wiley
&
Sons, New York,
1999.
159.
Y. Lin, H. Skaff, T. Emrick, A.D. Dinsmore, andT.P. Russell,
Science
299,226 (2003).
160.
W.R. Bowen andA.0. Sharif,
Nature
393,663 (1998).
161.
Z.L.
Wang,1
Phys.
Chem.
B104, 1153 (2000).
162.
Y. Huang,
X.
Duan, Q. Wei, and C.M. Lieber,
Science
291,630
(2001).
163.
P.A. Kralchevsky, K.D. Danov, and N.D. Denkov, in
Handbook
of
Surface and
Colloid Chemistry,
ed., K.S. Birdi, CRC Press, Boca Raton, FL, p.
333, 1997.
164.
A.J. Hurd and D.W. Schaefer,
Phys. Rev. Lett.
54, 1043 (1985).
165.
H.H. Wickman and J.N. Korley,
Nature
393, 445 (1998).
166.
PA. Kralchevsky and
K.
Nagayama,
Langmuir
10, 23
(1
994).
167.
J.C. Hulteen, D.A. Treichel, M.T. Smith,
M.L.
Duval, T.R. Jensen, and R.P.V. Duyne,
168.
P.A. Kralchevsky and N.D. Denkov,
Curr. Opin. Colloid InterJ: Sci.
6, 383
(2001).
169.
C.A. Murray and D.H.V. Winkle,
Phys. Rev. Lett.
58,
1200 (1987).
170.
A.T. Skjeltorp and
P.
Meakin,
Nature
335,424 (1988).
171.
N.D. Denkov, O.D. Velev, PA. Kralchevsky,
I.B.
Ivanov, H. Yoshimura, and
172.
P.
Jiang, J.F. Bertone,
K.S.
Hwang, and V.L. Colvin,
Chem. Muter.
11,2132 (1999).
173.
PC.
Ohara, D.V Leff, J.R. Heath, and W.M. Gelbart,
Phys.
Rev. Lett.
75,3466 (1995).
174.
H.C. Hamaker,
Physica
4,
1058 (1937).
175.
P.C. Ohara, J.R. Heath, and W.M. Gelbart,
Angm. Chem. Int. Ed. Engl.
36, 1078 (1997).
176.
S.
Murthy, Z.L. Wang, and R.L. Whetten,
Phil. Mag.
L75, 321 (1997).
177.
C.P. Collier,T. Vossmeyer, and J.R. Heath,
Ann.
Rev. Phys. Chem.
49, 371 (1998).
178.
S.A.
Harfenist, Z.L. Wang, R.L. Whetten,
I.
Vezmar, and M.M. Alvarez,
Adv. Muter.
179.
M.D. Bentzon,
J.
van Wonterghem,
S.
Morup, A. Thlen, and C.J. Koch,
Phil. Mag.
180.
M.D. Bentzon and A. Tholen,
Ultramicroscopy
38, 105 (1990).
18
1.
C.A. Stover, D.L. Koch, and C. Cohen,
J.
Fluid Mech.
238,277 (1 992).
182.
D.L. Koch and E.S.G. Shaqfeh,
Phys.
Fluids
A2,2093 (1990).
183.
B.M.I. van der Zande, G.J.M. Koper, and H.N. W. Lekkerkerker,
J
Phys. Chem.
B103,
184.
J.S. Yamamoto,
S.
Akita, andY. Nakayama,
J.
Phys.
D31, L34 (1998).
185.
P.A. Smith, C.D. Nordquist, T.N. Jackson,
T.S.
Mayer, B.R. Martin, J. Mbindyo, and
186.
H.A. Pohl,
Dielectrophoresis,
Cambridge University Press, Cambridge,
1978.
187.
M. Giersig and
P.
Mulvaney,
1
Phys. Chem.
97, 6334 (1 993).
188.
M. Giersig and P. Mulvaney,
Langmuir
9, 3408 (1 993).
M. Gabriel,
1
Vnc.
Sci. Technol.
B18, 3564
(2000).
and
L.
Samuelson,
Nanotechnology
13,666 (2002).
2000.
Nanostructures,
Kluwer, New York,
2002.
1
Phys. Chem.
B103,3854 (1999).
K. Nagayama,
Nature
361,26 (1993).
9, 817 (1997).
B60, 169 (1989).
5754
(1
999).
T.E. Malloouk,
Appl. Phys. Lett.
77, 1399 (2000).