(i.e., 0.1 ppb–0.1 ppm) and ability to detect/quantify any element in the Periodic
Table. In contrast to common bulk MS methods such as matrix-assisted laser
desorption/ionization (MALDI)
[103]
and electrospray ionization (ESI),
[104]
SIMS
analyzes samples in their native state without the need for a suitable matrix solution.
As a result, SIMS is the best choice to characterize organic-based thin films and
polymer surfaces.
The operating principle of SIMS is not unlike other techniques in this section;
that is, a high-energy (1–30 keV) ion source is directed onto a sample surface.
However, the absorption of this energy by the top ca.50A
˚
of the sample results in
the sputtering of neutral and charged (þ/) species from the surface.
[105]
These
ejected species primarily include neutral atoms and atomic clusters; however,
charged molecular fragments are also releas ed from the surface. Analogous to a
traditional mass spectrometer, SIMS analyzes these secondary ions based on their
relative mass/charge (m/z) ratios (Figure 7.44).
Depending on the desired species to be analyzed, a variety of primary ion
beams may be used such as Cs
þ
,O
þ
2
,O,Ar
þ
, and Ga
þ
. Whereas a cationic primary
beam such as Cs
þ
is used to ionize electronegative elements (e.g., O, C, N, chalco-
gens, halogens, etc.), oxygen atoms are used to ionize electropositive elements
(e.g., Li, Mg, Na, B, Al, etc.). Liquid metal ion beams (e.g., Ga, Au/Ge) are used
for high-resolution studies, since the beam may be focused to a smaller diameter
(<50 nm) for micron and nanoscale analyses.
There are two varieties of SIMS – static and dynamic. Static SIMS (often referred
to as time-of-flight SIMS, TOF-SIMS) is often the method-of-choice, used for
elemental analysis and imaging of the top two to three monolayers of a sample; in
comparison, dynamic SIMS is used to determine elemental concentrations of the
sample, as a function of depth. As such, dynamic SIMS is a destructive technique
primarily used for depth profiling, whereas TOF-SIMS does not appreciably deteri-
orate the surface being analyzed. For instance, due to a slow, controllable sputtering
rate, the entire analysis may be performed without removing less than one-tenths of
an atomic monolayer.
It should be noted that any SIMS analysis will at least result in surface roughness/
cratering and elemental mixing within the outermost monolayers. When the primary
beam interacts with surface atoms, the incident energy is transferred to target atoms
through a series of binary collisions. Some atoms/fragments receive sufficient
energy to be recoiled through the sample surface and are removed from the material.
However, other less noticeable effects will result such as the implanting of primary
ions, and mixing with sample atoms at depths of 10 nm below the surface. The
magnitude of these effects is governed by the incident beam,
[106]
as well as the
crystallinity and surface defects of the sample.
Dynamic SIMS typical ly uses a quadrupole mass analyzer; however, a TOF mass
analyzer offers much higher sensitivities (with limitations, vide infra) and mass
ranges. In a TOF-SIMS, an ion of known electrical charge, but unknown mass,
is accelerated by an electrical field. As a result, all ions of the same charge will
have identical kinetic energies. However, the velocity of the ion will depend on the
638 7 Materials Characterization