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3.9 EXTENDED X-RAY ABSORPTION FINE STRUCTURE
in the absorption coefficient. With proper data reduction, Fourier trans-
form of the EXAFS data gives the positions of neighboring atoms.
Q
UESTION FOR
D
ISCUSSION.
Both X-ray diffraction and EXAFS
provide structural information. Discuss the major differences between
these two techniques.
Although the use of X-rays weighs heavily toward the bulk proper-
ties of solids, we can make this technique surface-sensitive by looking
at the intensity of emitted Auger electrons instead. When the X-ray
energy is above the threshold, electron vacancies in the inner core level
are produced. This gives rise to Auger electron emission. Therefore,
the Auger electron current should also oscillate in the same manner as
the X-ray absorption coefficient as a function of the X-ray energy. The
surface structure can thus be extracted from these oscillations.
Alternatively, we can exploit the grazing incidence scattering tech-
nique. At sufficiently high photon energies, the refractive index of any
solid is slightly less than 1. Below a certain critical angle, total external
reflection results. The critical angle (i
o
) as measured from the surface
when this occurs is given by
i
o
⫽
冪
nr
e
(3.5)
where is the X-ray wavelength, n is the total electron density of the
solid, and r
e
is the classical radius of electron (⫽ 2.81 ⫻ 10
⫺15
m).
At an incidence angle i ⬍ i
o
as measured from the surface, the 1/e
penetration depth of the X-ray beam into the solid is equal to
2
兹
i
o
2
⫺ i
2
(3.6)
Under reasonable conditions, this penetration distance can be made as
small as 3–5 nm. Therefore, the surface sensitivity is further enhanced.
E
XAMPLE.
At an X-ray wavelength of 0.1 nm, calculate the critical
angle for external reflection for silicon. What is the X-ray mean penetra-
tion for silicon when the angle of incidence is 0.1⬚ from the surface?
S
OLUTION.
The total electron density for silicon is 5 ⫻ 10
28
⫻
28 ⫽ 1.4 ⫻ 10
30
electrons per cubic meter. Therefore, the critical