276 6 Photoelectron Spectroscopy of Catalytic Oxide Materials
The second motivation for doing an XPS analysis of materials is to learn about
the elemental stoichiometry of the near - surface region, which brings us to the
widely disputed issue of the P/V ratio of VPOs. The P/V ratio is often considered
to be an important factor in the catalytic properties of VPO [126, 128, 140, 171,
172] . This is mainly based on conventional XPS experiments, in which phosphorus
enrichment in the top few nanometers was found [140 – 142, 150, 156, 157, 159 –
162, 164, 168, 172, 173] . According to a literature survey, the P/V ratio varied
mainly in the range of 0.8 – 3 (Table 6.3 ). Owing to the different sampling depth
of V 2p and P 2p in typical ESCA experiments (as a result of the different kinetic
energies of the photoelectrons), surface impurities (e.g. carbon deposits) will
attenuate the lower KE electrons from vanadium more strongly and hence slightly
overestimate the P/V ratios. Furthermore, the calculation relies on the often -
questioned accuracy of photoemission cross - sections or sensitivity factors. To cir-
cumvent this problem, several attempts were made to apply reference substances
in recalibrating possible incorrect sensitivity factors [158, 165, 168, 174] . Okuhara
and coworkers [165, 174] prepared VPO glasses with different stoichiometry, and
found that the Scofi eld [175] sensitivity factors overestimate the P/V ratio by a
factor of 4.1/2.75 (i.e. by approximately +50%), decreasing the P/V ratio of their
VPO samples to values close to the nominal bulk composition. In the same vein,
using VPO glass Richter and coworkers [168] found a much smaller discrepancy
of only ∼ 14%, and their estimation gave a surface P/V ratio of 1.3 – 1.5. Considering
the sampling depth as 3 nm and assuming a profi le of P segregation, the phos-
phorus concentration in the top layer was assumed to be even higher. Ion - scatter-
ing spectroscopy experiments, showing a P/V ratio of 2 – 3, confi rmed this
hypothesis. Coulston and coworkers [158] used organometallic complexes contain-
ing vanadium and phosphorus for XPS calibration. The observed deviation was as
high as ∼ +75%, overestimating the theoretically calculated composition of the
phosphorus content. In this way, the surface composition of different VPO phases
nicely approached the nominal bulk values. Interestingly, the Scofi eld sensitivity
factors gave a fairly reasonable V
2
O
5.18
stoichiometry for vanadium pentoxide,
indicating that the problem of high P/V ratios is manifested in the phosphorus
calculation. As Richter [168] pointed out, the VPOs (even VPO glasses) are sensi-
tive to water/moisture, giving rise to hydrolysis of V
−
O
−
P bonds and hydration
of phosphate groups (see below). Therefore, if moisture - driven segregation of P
occurs in both VPOs and VPO glasses, the recalibration of cross - sections will
simply cancel out the P segregation, resulting in a stoichiometry resembling that
of the bulk. Unfortunately, even for organometallic complexes it has not been
proven that the ligands do not undergo X - ray - induced damage and are stable under
UHV conditions, which may hamper determination of the real P/V ratio. Hence
the calculated P/V ratios (whether recalibrated or not), should be approached, in
most cases, with caution.
There might, however, be some exceptions. Once the calculated ratios exceed 2,
even using Coulston ’ s recalibration, the P/V ratio (2/1.75) will be high enough to
account for a surface terminated by pyrophosphate groups. Sometimes, values
even higher than 2 were reported (see Table 6.3 ), which would clearly indicate