Egerton R.F. Electron Energy-Loss Spectroscopy in the Electron Microscope

Подождите немного. Документ загружается.

488 Index

Graphite, 7, 79, 150, 152, 205, 213, 215, 219,

221–223, 254, 256, 297, 330, 352, 361,

367–368, 378, 380–382, 384–385, 400,

402–403, 426

Graphene, 378–380

Hartree–Fock method, 114–116, 143, 186, 301,

339

Hartree–Slater calculations, 115, 189, 199,

201–202, 407, 416

Helium detection, 327–329

High-temperature superconductors, 6, 374–378

History of EELS, 1–28

Hole count, 211–213, 394

Hole drilling, 107, 389–397

Hydrogen detection, 16, 327

Hydrogenic model, 184–189, 210

Icosahedral crystals, 307

Image coupling of a spectrometer, 64, 71

Image spectrum, 30, 103, 107

Independent component analysis (ICA),

267–268, 325

Inelastic scattering of electrons, 124, 128

Instrumental background, 17, 75, 79, 258, 294,

408

Interface losses, 158, 167, 372

Ionization edges, 6, 9–10, 21, 75–76, 104–105,

107, 178–179, 194–195, 197–199,

203–204, 213, 215

–216, 218, 226,

249–253, 255, 257–262, 264–269, 272,

276–277, 280, 321, 325–329, 346, 349,

351–352, 361, 409, 413–416, 423,

429–430

Jellium model, 137, 141, 143, 147

Jump ratio of an edge, 75, 250

Jump-ratio image, 105, 321–323, 325

Kramers–Kronig analysis, 104, 243–249, 291,

302, 310, 312–313, 371–372, 376,

380,

385, 410–412

Kramers–Kronig sum rule, 245, 297, 302–303,

410, 416, 430

Kikuchi patterns, 351

Kröger formula, 154, 163, 412

Kunzl’s law, 361

Landau distribution, 176, 320

Laser-microprobe analysis (LAMMA), 15, 18

Lens coupling to spectrometer, 62–72

Lindhard model, 141–142, 146

Linearity of energy-loss axis, 74, 212–213,

236, 426

Lithium, measurement of, 329

Lithography, 394

Localization of inelastic scattering, 309,

337–340, 347

Lonsdaleite, 382

Magnetic moment, 359

Magnetic-prism spectrometer, 14, 30–33,

44–62

Mandoline ﬁlter, 35–37, 100, 102

Mass loss during irradiation, 391

Matrix calculations for spectrometer, 49–55

405

Maximum-entropy deconvolution, 255

Maximum-likelihood deconvolution, 255, 409

Mean energy loss, 127, 196, 170–171, 176,

348, 407, 416–417

Mean free path (MFP)

elastic, 294

inelastic, 119, 146, 182, 208, 213, 218,

282, 285, 287, 295–300, 304, 316, 329,

387, 390, 407, 412, 417, 419–426

phonon, 121

plasmon, 138, 181, 231, 309, 410, 417, 419

Mean inelastic-scattering angle, 125, 143–145,

224, 350

Memory effects in detector, 94

Micelles, 361

Microanalysis

by EELS, 9–13, 293–397

with incident electrons, 27–28, 274

with incident ions, 384

with incident photons, 17–18

Mirror plates, 48–49

Minimum detectable mass, 24

Mixed scattering, 8, 176, 184, 203

Modiﬁcation function, 234, 252

Möllenstedt analyzer, 10–11

Monochromators, 1, 11, 15, 39–44, 100, 243,

344, 368

Most-probable loss, 176

Monte Carlo calculations, 174

Mott cross section, 115, 123, 393, 406

Multiple least squares (MLS) ﬁtting, 265, 276,

307, 326, 343

Index 489

Multiple scattering, 6, 144, 169–178, 181, 206,

213–215, 220, 228, 285–288, 295, 352,

355, 367

Multiplet splitting, 216

Multipole lenses, 55, 87

Multivariate statistical analysis (MSA),

265–269, 344

Nanotubes, 44, 150, 155, 164, 168, 312, 332,

342, 344, 369–370, 378, 380

Natural width

of core levels, 207

of plasmon peaks, 407

Neural pattern recognition, 372

Noise performance

of parallel-recording detector, 14, 22, 85

of serial-recording detector, 30, 88, 332

Nonisochromaticity, 59–62

Notation for atomic shells, 426

Object function,

223, 226, 337

Occupancy of core levels, 204–205

Omega ﬁlter, 12, 14, 35–37, 41, 100–102

Optical alchemy approximation, 212, 284

Optical density of states, 155, 369

Oscillator strength

core-loss, 133, 187

dipole (optical), 129, 188, 197, 274, 402,

414, 416

Parallel recording of spectrum, 13, 30, 65, 86,

88, 103, 107, 250, 269, 325, 332, 334,

342, 368

Partial wave method, 115

Phonon excitation, 3, 111, 119, 317

Phosphor screens, 58, 95

Phosphorus measurement, 387

Photoabsorption cross section, 188–190

Photodiode arrays, 85

Photoelectron spectroscopy (UPS, XPS), 15,

18, 204, 208, 216, 361

Photomultiplier tube (PMT), 13, 77, 79–83

Plasmon

bulk (volume), 5, 140, 156, 158, 161, 163,

165–166, 225, 311, 378, 394–395

damping, 142, 146–147

dispersion, 141–142, 147

double, 177–178, 329

energies, 255, 309, 312, 419–422

surface, 5, 11, 140, 154, 156, 158–169,

171, 221, 225, 227, 301–302

, 310, 319,

368–369, 378, 380

wake, 139–141

Plasmonic modes, 311

Plasmon-loss microanalysis, 12, 164, 168, 174,

227, 239–240, 254, 302, 312, 339, 409

Plasmon-pole model, 147

Plural scattering, 6–7, 24, 75, 109, 164,

171–172, 174–175, 177–178, 181–183,

195, 197, 203–204, 214, 231, 234, 241,

243, 245, 249–251, 254, 257–

259, 265,

268, 271–272, 276–278, 295, 302–305,

307, 309, 316, 319, 322, 325, 327, 334,

342, 353–354, 384, 387, 390, 407–408,

413, 416–417

in pre-edge background, 181–183, 325

Point-spread function

chromatic aberration, 65–66, 316

of diode-array detector, 89, 98

for inelastic scattering, 224–225, 315–316,

337

Poisson’s law, 170–172, 177

Polymers, 107, 312, 320, 327, 330–

331, 352,

380, 386–390

Postspecimen lenses, 63–72, 101

Prespectrometer optics, 63–72

Principal component analysis (PCA), 264–268

Principal sections, 31, 46

Prism–mirror spectrometer, 34–35

Proton-induced x-ray emission (PIXE), 15, 17

Quadrupoles, 13–14, 38–39, 42–43, 50–52,

56–58, 72, 86–87, 168, 288

Radial distribution function (RDF), 218–219,

277–278, 280–282, 284–285, 317,

362–364

Radiation damage

in diode array, 72, 88, 90, 93, 107,

368

displacement (sputtering), 24, 111, 329

dose-rate dependence, 107, 391

mass loss, 301

temperature dependence, 365

Radiation energy losses, 154–155, 369

Random phase approximation, 132, 141–142

Ratio imaging, 108–109

Ray tracing, 53

Readout noise of diode array, 93–94

Reference spectra, 265, 269, 276, 306, 375

Reﬂection-mode spectra, 28, 314, 382

490 Index

Refraction of electrons, 165

Relativistic scattering, 190–193, 399–404

Relaxation effects, 205, 284

Retarding-ﬁeld analyzer, 35

Retardation, 39, 154–155, 159–160, 162–163,

167, 197, 248, 400–401, 410, 412,

415–416

Rutherford backscattering (RBS), 15, 17

Rutherford scattering, 2, 113, 129, 188, 191,

195, 218, 280, 285, 366

Scanning the loss spectrum, 73, 77

Scattering of electrons

elastic, 2–3, 12–13, 16, 18, 20, 23,

105–106,

108–109, 111–124, 126, 130,

166, 175–176, 190, 218, 227, 271–273,

277, 294–295, 302–303, 306, 316–317,

319, 324, 327, 336–337, 339–340, 350,

370, 389, 406–407

inelastic, 124

inner-shell, 3, 8, 16, 187, 194, 196, 250,

274, 366, 414

phonon, 120–121, 351, 367

Scattering parameter, 165, 170

–171, 237,

407–408

Scattering vector, 112–113, 124, 129, 131, 141,

147, 152, 158, 185, 190, 220, 366, 367,

370, 399–400

Scintillators, 13, 35, 59, 77, 79–84, 86–94,

109, 241, 408

SCOFF approximation, 45–47, 49, 52, 54, 406

Scree plot, 266–267, 344

Secondary electrons, 4–5, 20, 24, 77, 81–82,

124, 227,

336, 342, 390, 394

Secondary ion mass spectrometry (SIMS),

15–16, 18, 371

Sector magnet, 32, 50

Segmentation, 388

Selection rules

dipole, 200, 203, 207, 210, 219, 283, 375

spin, 359–360

Serial acquisition, 33, 69, 75, 77, 83, 85

Sextupoles, 14, 32, 36–37, 42–43, 51–52,

55–57, 100

Shape resonance, 214, 356

Sharpening of spectral peaks, 240, 243

Signal averaging, 74–75

Signal/noise ratio (SNR)

in parallel recording, 23, 91–96, 342

in serial recording, 76, 79, 83

Silicon-diode detectors, 79, 85

Simultaneous EELS/EDX analysis, 25, 293

Single-electron excitation, 4–5, 121, 140–141,

144, 146–152, 181, 419

Solid-state effects

on core-loss cross section, 340–341

on ionization-edge shape, 133, 138

on low-loss scattering, 132

Spatial resolution of EELS, 337

Spatially-resolved spectroscopy (SREELS),

29, 361

Specimen

etching in electron beam, 392

heating in electron beam, 390

preparation for TEM, 28

Spectrometer

alignment of, 58

magnetic-prism, 14, 30–33, 44–62

types of, 9, 28–44

Spectroscopic atomic-shell notation, 426

Spectrum-image, 103–105, 266

Spectrum recording, 72, 85, 93, 429

Spin-orbit splitting, 153, 200, 202, 209, 357

Sputtering, 3, 16

–17, 111, 122–123, 331, 342,

385, 390, 393, 395–397, 406, 430

Stabilization of energy-loss spectrum, 42, 57,

74, 94

Standards

composition, 274, 326

energy calibration, 426

Stopping power, 127, 131, 134, 194

Straggling, 176

Stray-ﬁeld compensation, 62

Sub-pixel scanning, 108

Sulfur analysis, 334, 386

Sum rule

Bethe, 132, 301, 304–306, 385

Kramers–Kronig, 245, 297, 302–303, 410,

416, 430

Superconductors, 6, 374–378

Surface

correction for, 248

effect on volume loss, 161–162, 410–411

Surface-plasmon losses, 156, 163, 301

Thickness measurement, 294–295, 416

Thermal spread, 39–44

Thick-specimen analysis, 154, 176, 316, 320,

351, 414

Thomas–Fermi model, 124

Thomas–Reiche–Kuhn sum rule: see Bethe

sum rule

Time-resolved spectroscopy, 26

Transition matrix, 129, 186, 206, 209, 403

Index 491

Transition metals, 13, 23, 135, 138, 145, 148,

189, 200, 203, 205, 209, 213–216, 270,

278, 291, 331, 334, 349, 353, 357–360,

362, 423

Transition radiation, 155, 162

TRANSPORT computer program, 51–52, 54

Vibrational modes, 1, 11, 39, 41

Void resonances, 168

Voltage/frequency converter, 83–85

Vortex beam, 360

Wake potential, 140

Water content of tissue, 307, 388

White lines, 200–202, 205, 213, 216, 269–270,

293,

334, 346, 349, 357–360

Wien ﬁlter, 11–12, 15, 29, 37–44, 100

X-ray absorption ﬁne structure (EXAFS), 18,

213, 217–220, 277, 280–281, 284–286,

293, 364, 366

X-ray absorption near-edge structure

(XANES), 18, 213, 220, 286, 288, 293,

352

X-ray absorption spectroscopy (XAS), 15, 18,

204–205, 207, 213, 216, 291, 293, 356

X-ray emission spectroscopy (XES), 15–16,

20, 23, 336, 347

X-ray microscope, 18

YBCO superconductor, 375–

377

Z-contrast imaging, 108

Z-ratio imaging, 108–109