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136 4 Alignment and Ordering of Block Copolymer Morphologies
constituted by fi lms of other polymers [281 – 285] . For instance, a variety of poly-
mers, including PE, nylons, polyesters, and liquid crystalline polymers, have been
grown in highly oriented form on the oriented surface of poly(tetrafl uoroethylene)
( PTFE ) crystals [281] . In the case of PE, the orientation of the crystals is such that
the c - axis lies in the plane of the fi lm and the bc plane of the unit cell is in contact
with the substrate surface [285] . Different orientations, for instance, a fi ber - like
alignment, have been observed for other polymers [285] . This suggests that the
alignment of materials on PTFE fi lms can occur by graphoepitaxial or epitaxial
mechanisms, depending on the materials. In some instances both the lattice
structure and the surface topography of the PTFE fi lms promote the alignment,
so that the two mechanisms can operate in conjunction [285] .
Graphoepitaxy was utilized by Segalman and coworkers [286, 287] to control the
orientation of BC microdomains. The procedure is an example of the combined
top - down and bottom - up approaches to patterning. Segalman ’ s group used topo-
graphically alternating mesa and well patterns fabricated by conventional photoli-
thography and chemical etching techniques to align spherical P2VP microdomains
of a PS - b - P2VP diblock copolymer. A large area single crystal of the P2VP spheres
was obtained on the mesas and wells [286] .
Nanostructures with long - range order were also developed using graphoepitaxy
in combination with BC lithography [288, 289] . Cheng et al . employed a diblock
copolymer of PS - b - PFS, in which the organometallic PFS block provides an excel-
lent (10 : 1) etching contrast in an oxygen plasma [287] . A topographically patterned
silica substrate was fabricated by interference lithography, after which the sub-
strate was used for a templating BC self - assembly. Monolayer fi lms of the BC were
deposited by spin - casting and annealed onto the patterned silica substrate. The
fi lm was then oxidized by etching in an oxygen plasma. Scanning electron micro-
scopy ( SEM ) images of annealed and etched PS - b - PFS fi lms, reported in Figure
4.15 , revealed ordered arrays of PFS spheres in grooves of different widths [288] .
A thin PFS – PS brush layer is present at the groove edge and bottom where the
PFS block wets the silica substrate. This surface - induced thin layer was shown to
drive the ordering of the PS – PFS block copolymer microdomains, and resulted in
PFS spherical microdomains parallel to the groove edges. In the microstructure
with grooves having a width of 240 nm (Figure 4.15 c), and comparable to the
typical block copolymer grain size, a near - perfect alignment of PFS spherical
microdomains was achieved. The microdomain patterns were transferred onto the
underlying silica substrate using a reactive ion etcher ( RIE ) process with a CHF
3
plasma, so as to create well - ordered arrays of silica posts [288] . The oxidized PFS
domains are perfectly ordered by the guided self - assembly of the BC in the prepat-
terned substrate, and can potentially be useful for fabricating 2 - D photonic crystal
waveguide structures. More recently, other investigations have confi rmed the
general applicability of this approach employing spherical, cylindrical or lamellar
diblock copolymers to yield 2 - D patterns into different lithographic features [35,
36, 38, 290, 291] . However, as the pre - pattern size should be determined by the
grain size of the block copolymers, only patterns with a small periodicity are
applicable. To overcome this problem, graphoepitaxy should be combined with