Ohno S., Kawaguchi Y., Miyamura A. etc. High rate deposition of tin-doped indium oxide films by reactive magnetron

Second Edition, William Andrew, 2011, 530 pages Roll-to-roll vacuum deposition is the technology that applies an even coating to a flexible material that can be held on a roll and provides a much faster and cheaper method of bulk coating than deposition onto single pieces or non-flexible surfaces, such as glass. This technology has been used in industrial-scale applications for some time, including a wide range of metalized packaging (e.g. snac...

Wiley-VCH, Weinheim, 2008, 457 pages A panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental technology, including plasma production and control, high-pressure discharges, modeling and simulation, diagnostics...

16th International Symposium on Plasma Chemistry, Taormina, Italy June 22-27, 2003 Wiley-VCH, Weinheim, 2005, 545 pages This volume compiles essential contributions to the most innovative fields of Plasma Processes and Polymers. High-quality contributions cover the fields of plasma deposition, plasma treatment of polymers and other organic compounds, plasma processes under partial vacuum and at atmospheric pressure, biomedical, textile, automot...

Academic Press, San Diego, 1994, 322 c. В книге представлены несколько больших обзоров: 1) Конструкция плазменных источников высокой плотности для обработки материалов 2) Плазменные источники на основе электрон-циклотронного резонанса и их использование для плазменного осаждения тонких пленок 3) Несбалансированное магнетронное распыление 4) Формирование частиц (пылевых) в технологической плазме.

Springer-Verlag, Berlin, 2009, 732 pages This monograph presents an up to date perspective of gas discharge physics and its applications to various industries. It starts from a comprehensive overview of the different types to generate plasmas by DC discharges, capacitive and inductive radiofrequency coupling, helicon waves including electron cyclotron resonance, and ion beams. To compare these theories with inert plasmas, a fundamental descript...

CRC Press, Taylor & Francis Group, 2005, Pages: 592 While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devi...

William Andrew, 2010, 912 pages Recent years have seen a rapid expansion in the applications of advanced thin film coatings in areas including photovoltaics, energy conversion, energy efficiency, biomedical engineering, telecommunications, pharmaceuticals and flat panel displays. In a tough economic climate, surface engineering remains a growth industry, because surface engineered products improve performance, increase energy efficiency, add fu...

Noyes Publications, William Andrew Publishing, 2003, ISBN-10: 0815514956, 60 pages Text provides a review of the discoveries, inventions, and people behind vacuum coating technology, past and present. Includes more than 370 references, acronyms used in vacuum coating, and a glossary of terms. For materials scientists, and engineers working with vacuum coating in the invention of new technologies or applications. Early Vacuum Science and Techn...

Elsevier Science, 2006, Pages: 722 The current status of the science and technology related to coatings, thin films and surface modifications produced by directed energy techniques is assessed in this book. The subject matter is divided into 20 chapters - each presented at a tutorial level - rich with fundamental science and experimental results. New trends and new results are also evoked to give an overview of future developments and applicat...

Noyes publications, Park Ridge, New Jersey, U.S.A. 1990, 536 стр. Рассматриваются физические основы ряда газовых разрядов, используемых в плазменных технологиях для травления и осаждения различных покрытий. Книга имеет следующие разделы. Techniques for ic processing. Introduction to plasma concepts and discharge configurations. Fundamentals of sputtering and reflection. Bombardment-Induced compositional change with alloys, Oxides, Oxysalts, And h...