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Francombe M.H., Vossen J.L. Physics of Thin Films. Plasma Sources for thin film deposition and etching
Academic Press, San Diego, 1994, 322 c.
В книге представлены несколько больших обзоров:
1) Конструкция плазменных источников высокой плотности для обработки материалов
2) Плазменные источники на основе электрон-циклотронного резонанса и их использование для плазменного осаждения тонких пленок
3) Несбалансированное магнетронное распыление
4) Формирование частиц (пылевых) в технологической плазме.
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