InTech. 2011. 626 p.
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Content
Preface
Electron and Ion Beam Lithography
Electron Beam Lithography for Fine Dot Arrays with Nanometer-Sized Dot and Pitch
Focused Ion Beam Lithography
Atom Lithography: Fabricating Arrays of Silicon Microstructures Using Self-Assembled Monolayer Resist and Metastable Helium Beam
Character Projection Lithography for Application-Specific Integrated Circuits
Transform-Based Lossless Image Compression Algorithm for Electron Beam Direct Write Lithography Systems
Nanoimprint and Soft Lithography
Ultrafast Fabrication of Metal Nanostructures Using Pulsed Laser Melting
Soft UV Nanoimprint Lithography: A Versatile Tool for Nanostructuration at the 20nm Scale
Repairing Nanoimprint Mold Defects by Focused-Ion-Beam Etching and Deposition
Improving the Light-Emitting Efficiency of GaN LEDs Using Nanoimprint Lithography
Fabrication of Circular Grating Distributed Feedback Dye Laser by Nanoimprint Lithography
Application of Nanoimprint Lithography to Distributed Feedback Laser Diodes
Guided-Mode Resonance Filters Fabricated with Soft Lithography
Interference, Two-Photon, UV and X-Ray Lithography
DUV Interferometry for Micro and Nanopatteed Surfaces
Ultrashort Pulsed Lasers – Efficient Tools for Materials Micro-Processing
Laser-Based Lithography for Polymeric Nanocomposite Structures
Fabrication of 3-D Structures Utilizing Synchrotron Radiation Lithography
Emerging Maskless Nanolithography Based on Novel Diffraction Gratings
EUV Lithography and Resolution Enhancement Techniques
Laser-Plasma Extreme Ultraviolet Source Incorporating a Cryogenic Xe Target
Irradiation Effects on EUV Nanolithography Collector Mirrors
High-Index Immersion Lithography
Double Patteing for Memory ICs
Diffraction Based Overlay Metrology for Double Patteing Technologies
Other Lithographic Technologies: Scanning Probe, Nanosphere, Inkjet Printing, etc.
Nanolithography Study Using Scanning Probe Microscope
Scanning Probe Lithography on Organic Monolayers
Controlled Fabrication of Noble Metal Nanomaterials via Nanosphere Lithography and Their Optical Properties
A Feasible Routine for Large-Scale Nanopatteing via Nanosphere Lithography
Electrohydrodynamic Inkjet – Micro Patte Fabrication for Printed Electronics Applications
Lithography-Free Nanostructure Fabrication Techniques Utilizing Thin-Film Edges
Extremely Wetting Patte by Photocatalytic Lithography and Its Application
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Content
Preface
Electron and Ion Beam Lithography
Electron Beam Lithography for Fine Dot Arrays with Nanometer-Sized Dot and Pitch
Focused Ion Beam Lithography
Atom Lithography: Fabricating Arrays of Silicon Microstructures Using Self-Assembled Monolayer Resist and Metastable Helium Beam
Character Projection Lithography for Application-Specific Integrated Circuits
Transform-Based Lossless Image Compression Algorithm for Electron Beam Direct Write Lithography Systems
Nanoimprint and Soft Lithography
Ultrafast Fabrication of Metal Nanostructures Using Pulsed Laser Melting
Soft UV Nanoimprint Lithography: A Versatile Tool for Nanostructuration at the 20nm Scale
Repairing Nanoimprint Mold Defects by Focused-Ion-Beam Etching and Deposition
Improving the Light-Emitting Efficiency of GaN LEDs Using Nanoimprint Lithography
Fabrication of Circular Grating Distributed Feedback Dye Laser by Nanoimprint Lithography
Application of Nanoimprint Lithography to Distributed Feedback Laser Diodes
Guided-Mode Resonance Filters Fabricated with Soft Lithography
Interference, Two-Photon, UV and X-Ray Lithography
DUV Interferometry for Micro and Nanopatteed Surfaces
Ultrashort Pulsed Lasers – Efficient Tools for Materials Micro-Processing
Laser-Based Lithography for Polymeric Nanocomposite Structures
Fabrication of 3-D Structures Utilizing Synchrotron Radiation Lithography
Emerging Maskless Nanolithography Based on Novel Diffraction Gratings
EUV Lithography and Resolution Enhancement Techniques
Laser-Plasma Extreme Ultraviolet Source Incorporating a Cryogenic Xe Target
Irradiation Effects on EUV Nanolithography Collector Mirrors
High-Index Immersion Lithography
Double Patteing for Memory ICs
Diffraction Based Overlay Metrology for Double Patteing Technologies
Other Lithographic Technologies: Scanning Probe, Nanosphere, Inkjet Printing, etc.
Nanolithography Study Using Scanning Probe Microscope
Scanning Probe Lithography on Organic Monolayers
Controlled Fabrication of Noble Metal Nanomaterials via Nanosphere Lithography and Their Optical Properties
A Feasible Routine for Large-Scale Nanopatteing via Nanosphere Lithography
Electrohydrodynamic Inkjet – Micro Patte Fabrication for Printed Electronics Applications
Lithography-Free Nanostructure Fabrication Techniques Utilizing Thin-Film Edges
Extremely Wetting Patte by Photocatalytic Lithography and Its Application