John Wiley & Sons Ltd, 2003. - 667 p.
PART 1: GENERAL ASPECTS OF CRYSTAL GROWTH TECHNOLOGY.
PART 2: SILICON
PART 3: COMPOUND SEMICONDUCTORS.
PART 4: OXIDES AND HALIDES.
PART 5: CRYSTAL MACHINING.
PART 6: EPITAXY AND LAYER DEPOSITION.
PART 1: GENERAL ASPECTS OF CRYSTAL GROWTH TECHNOLOGY.
PART 2: SILICON
PART 3: COMPOUND SEMICONDUCTORS.
PART 4: OXIDES AND HALIDES.
PART 5: CRYSTAL MACHINING.
PART 6: EPITAXY AND LAYER DEPOSITION.